Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
First Claim
1. A method for determining an offset between a center of a substrate and a center of a depression in a chuck, comprising:
- providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression;
measuring a position of an alignment mark of the test substrate while in the depression; and
determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
0 Assignments
0 Petitions
Accused Products
Abstract
A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.
50 Citations
34 Claims
-
1. A method for determining an offset between a center of a substrate and a center of a depression in a chuck, comprising:
-
providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression;
measuring a position of an alignment mark of the test substrate while in the depression; and
determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A method for determining an offset between a center of a substrate and a center of a depression in a chuck, comprising:
-
measuring a gap between an edge of the substrate disposed inside the depression and an edge of the depression at a plurality of locations;
determining a center of the substrate using the measurements of the gap;
determining a chuck centering offset of the substrate between the center of the depression and the measured center of the substrate at the chuck;
providing the substrate to a prealigner and determining a center of the substrate at the prealigner;
determining a prealigner centering offset between a nominal center of the substrate and the measured center of the substrate at the prealigner; and
combining the chuck centering offset and the prealigner centering offset to obtain a global centering offset. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
-
-
20. A method for determining an offset between a center of a substrate and a center of a depression in a chuck, comprising:
-
loading the substrate on a pin of the chuck and moving the substrate by translating the pin in a first direction until the substrate reaches an opening of the depression in the chuck;
determining to what extent the substrate should be translated in a plane substantially perpendicular to the first direction to allow the substrate to enter inside the depression without colliding with a surface of the chuck or an edge of the depression in the chuck; and
determining the offset of the substrate relative to the depression from determination of the translation in the plane. - View Dependent Claims (21, 22, 23, 24, 25)
-
-
26. A lithographic projection apparatus comprising:
-
a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate;
a sensor configured to measure a position of the substrate, a sensor configured to measure a gap between an edge of the substrate disposed inside the depression and an edge of the depression, or a sensor configured to measure both the position and the gap; and
a substrate handling system in communication with the sensor configured to position the substrate inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34)
-
Specification