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Substrate treatment apparatus

  • US 20070217896A1
  • Filed: 02/27/2007
  • Published: 09/20/2007
  • Est. Priority Date: 03/03/2006
  • Status: Active Grant
First Claim
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1. A substrate treatment apparatus, comprising:

  • a process room;

    a load port in which a container receiving wafers is disposed; and

    a wafer transfer module disposed between the load port and the process room to transfer the wafers between the load port and the process room, the wafer transfer module including;

    a first barrier,a second barrier extending from a first end of the first barrier at a first predetermined angle with respect to the first barrier, anda third barrier extending from a second end of the first barrier at a second predetermined angle with respect to the first barrier, wherein the load port is provided along the first barrier, and the process room includes a plurality of chambers arranged along the second and third barriers.

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