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Method of forming a carbon polymer film using plasma CVD

  • US 20070218705A1
  • Filed: 09/20/2006
  • Published: 09/20/2007
  • Est. Priority Date: 08/09/2004
  • Status: Active Grant
First Claim
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1. A method of forming a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus, which comprises the steps of:

  • vaporizing a hydrocarbon-containing liquid monomer (Cα

    Hβ

    Xγ

    , wherein α and

    β

    are natural numbers of 5 or more;

    γ

    is an integer including zero;

    X is O, N or F) having a boiling point of about 20°

    C. to about 350°

    C.;

    introducing said vaporized gas into a CVD reaction chamber inside which a substrate is placed; and

    forming a hydrocarbon-containing polymer film on said substrate by plasma polymerization of said gas.

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