Exposure apparatus, exposure method, and method for producing device
First Claim
1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate, the space being smaller in plan than the substrate, the apparatus comprising a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
0 Assignments
0 Petitions
Accused Products
Abstract
A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
-
Citations
30 Claims
- 1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate, the space being smaller in plan than the substrate, the apparatus comprising a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
-
10. A lithographic apparatus, comprising:
-
an illuminator configured to condition a radiation beam;
a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and
a plate substantially parallel to the substrate to divide the space into two parts, the plate having at least a portion thereof radiation transmissive to allow transmission of the pattern onto the substrate. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
-
-
22. A device manufacturing method, comprising:
-
supplying a liquid to a space adjacent a substrate, the space being smaller in plan than the substrate and divided into two parts by a plate substantially parallel to the substrate, the plate having at least a portion transmissive to radiation; and
projecting a patterned beam of radiation through the liquid and through the portion onto the substrate. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30)
-
Specification