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Exposure apparatus, exposure method, and method for producing device

  • US 20070222957A1
  • Filed: 05/18/2007
  • Published: 09/27/2007
  • Est. Priority Date: 06/10/2004
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate, the space being smaller in plan than the substrate, the apparatus comprising a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.

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