Lithographic apparatus, radiation supply and device manufacturing method
First Claim
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1. A lithographic projection apparatus, comprising:
- an illumination system configured to condition a pulsed beam of radiation;
a radiation beam divider configured to divide the pulsed beam of radiation into at least first and second pulsed sub-beams of radiation;
at least one sensor, configured to determine a radiation dose of a pulse of radiation in the pulsed beam of radiation or the pulsed first and second sub-beams of radiation;
an optical delay line, configured to delay a pulse of radiation after the radiation dose of the pulse of radiation has been determined by said at least one sensor;
a first radiation pulse modulator, configured to adjust a radiation dose of a pulse of radiation in said first pulsed sub-beam of radiation based on the radiation dose determined by the at least one sensor; and
a second radiation pulse modulator, configured to adjust a radiation dose of a pulse of;
radiation in said second pulsed sub-beam of radiation based on the radiation dose determined by said at least one sensor.
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Abstract
A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.
32 Citations
21 Claims
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1. A lithographic projection apparatus, comprising:
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an illumination system configured to condition a pulsed beam of radiation;
a radiation beam divider configured to divide the pulsed beam of radiation into at least first and second pulsed sub-beams of radiation;
at least one sensor, configured to determine a radiation dose of a pulse of radiation in the pulsed beam of radiation or the pulsed first and second sub-beams of radiation;
an optical delay line, configured to delay a pulse of radiation after the radiation dose of the pulse of radiation has been determined by said at least one sensor;
a first radiation pulse modulator, configured to adjust a radiation dose of a pulse of radiation in said first pulsed sub-beam of radiation based on the radiation dose determined by the at least one sensor; and
a second radiation pulse modulator, configured to adjust a radiation dose of a pulse of;
radiation in said second pulsed sub-beam of radiation based on the radiation dose determined by said at least one sensor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A device manufacturing method, comprising
conditioning a pulsed beam of radiation; -
dividing the pulsed beam of radiation into at least first and second pulsed sub-beams of radiation;
determining a radiation dose of at least one pulse of radiation of said pulsed beam of radiation or pulsed sub-beams of radiation;
delaying said pulse of radiation in an optical delay line after the radiation dose of the pulse has been determined;
adjusting a radiation dose of a pulse of radiation in said first pulsed sub-beam of radiation based on said determined radiation dose of said at least one pulse; and
adjusting a radiation dose of a pulse of radiation in said second pulsed sub-beam of radiation based on said determined radiation dose of said at least one pulse. - View Dependent Claims (19, 20)
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21. A radiation supply system suitable for use with a pulsed source of radiation, comprising:
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a radiation beam divider configured to divide a pulsed beam of radiation into at least first and second pulsed sub-beams of radiation;
at least one sensor, configured to determine a radiation dose within a pulse of radiation in the pulsed beam of radiation or the pulsed sub-beams of radiation;
an optical delay line, configured to delay a pulse of radiation after the radiation dose of the pulse has been determined by the sensor;
a first radiation modulator, configured to adjust a radiation dose of a pulse of radiation in said first pulsed sub-beam of radiation based on the radiation dose of said pulse determined by said at least one sensor;
a second radiation modulator, configured to adjust the radiation dose of a pulse of radiation in said second pulsed sub-beam of radiation based on the radiation dose of said pulse determined by said at least one sensor.
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Specification