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Post structure, semiconductor device and light emitting device using the structure, and method for forming the same

  • US 20070224831A1
  • Filed: 02/22/2007
  • Published: 09/27/2007
  • Est. Priority Date: 03/23/2006
  • Status: Active Grant
First Claim
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1. A method for forming a post structure comprising:

  • forming unit patterns on a substrate by use of a first material;

    growing a wet-etchable second material on the substrate formed with the unit patterns; and

    wet etching the substrate having the grown second material.

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