Devices and methods for inter-vertebral orthopedic device placement

• US 20070233083A1
• Filed: 12/19/2006
• Published: 10/04/2007
• Est. Priority Date: 12/19/2005
• Status: Active Grant

• Current Assignee: Nuvasive Incorporated
• Original Assignee: M. S. Abdou
• Inventors: Abdou, M. S.
• Granted Patent: US 8,002,802 B2
• Time in Patent Office: Days
• US Class Current: 623/17.110
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 2017/0256 for the spine

Abstract

A spinal implant device includes a spacer region and an attachment region. The spacer region is adapted to be positioned between first and second spinous processes of first and second vertebral bodies to limit movement of the first spinous process and the second spinous process toward one another. The attachment region attaches to the first spinous process via a fastener that extends substantially along a long axis of the spinous process.

Claims

1. A spinal implant device, comprising:

a spacer region adapted to be positioned between first and second spinous processes of first and second vertebral bodies to limit movement of the first spinous process and the second spinous process toward one another; and

an attachment region attached to the spacer region, the attachment region adapted to attach to the first spinous process via a fastener that extends substantially along a long axis of the spinous process.

2. A device as in claim 1, wherein the attachment region attaches to an anterior segment of the spinous process.

3. A device as in claim 1, wherein the attachment region attaches to a laminal segment of the spinous process.

4. A device as in claim 1, wherein the attachment region attaches an anterior segment and a laminal segment of the spinous process.

5. A device as in claim 1, wherein the attachment region includes at least one pair of flaps that receive the first spinous process therebetween.

6. A device as in claim 1, wherein the spacer region includes an internal cavity for receipt of a bone segment.

7. A device as in claim 1, wherein the spacer region is movable relative to the attachment region.

8. A device as in claim 7, wherein the position of the space region relative to the attachment region is adjustable.

9. A spinal implant device, comprising:

a first attachment region that attaches to a first spinous process via a fastener that extends substantially along a long axis of the first spinous process;

a second attachment region that attaches to a second spinous process, wherein the first attachment region and the second attachment region can move a limited distance toward one another and a limited distance away from one another to limit relative movement between the first and second spinous processes.

10. A device as in claim 9, further comprising a resiliently deformable region between the first and second attachment regions.

11. A device as in claim 9, wherein the first and second attachment regions are slidably movable relative to one another.

12. A device as in claim 9, wherein the first and second attachment regions are biased toward a default position relative to one another.

13. A device as in claim 9, wherein at least one of the attachment regions attaches to an anterior segment of the spinous process.

14. A device as in claim 9, wherein at least one of the attachment regions attaches to a laminal segment of the spinous process.

15. A device as in claim 9, wherein at least one of the attachment regions attaches an anterior segment and a laminal segment of the spinous process.

16. A device as in claim 9, wherein at least one of the attachment regions includes a pair of flaps that receive the first spinous process therebetween.

17. A spinal implant device, comprising:

a plate having a first attachment region that attaches to a first spinous process and a second attachment region that attaches to a second spinous process, the plate further having a spacer region between the first and second attachment regions, the spacer region adapted to permit relative movement between the first and second attachment regions.

18. A spinal implant as in claim 17, wherein the spacer region is flexible.

19. A spinal implant as in claim 17, wherein at least one of the attachment regions attaches to the spinous process via a fastener that extends substantially along a long axis of the spinous process.

20. A device as in claim 17, wherein at least one of the attachment regions attaches to a laminal segment of the spinous process.

21. A method of stabilizing the spine, comprising:

attaching a first portion of a spinal implant to a first spinous process of a first vertebral body wherein the first portion of the spinal implant is attached to the long axis of the first spinous process;

attaching a second portion of the spinal implant to a second spinous process of a second vertebral body, wherein the spinal implant limits movement of the first spinous process relative to the second spinous process.

22. A method as in claim 21, wherein the first portion of the spinal implant is attached to the lamina of the spinous process.

23. A method as in claim 21, wherein the first portion of the spinal implant is attached to the lamina of the spinous process and to the long axis of the spinous process.

24. A method of stabilizing the spine, comprising:

fastening a first distraction member to a first spinous process of a first vertebral body wherein the distraction screw extends along a long axis of the first spinous process;

attaching a second distraction member to a second spinous process of a second vertebral body;

distracting the first and second spinous processes using the first and second distraction members; and

placing an implant between the first and second spinous processes wherein the implant modulates relative movement between the first and second spinous processes.

25. A method of stabilizing the spine, comprising:

removing a segment of the inferior aspect of the superior lamina and a segment of the inferior facet surface of the superior vertebra;

removing a segment of the superior aspect of the inferior lamina and a segment the superior facet surface of the inferior vertebra; and

placing an implant between the two vertebrae.

26. A method as in claim 25, further comprising distracting the vertebrae using spinous processes of the vertebrae.

27. A method as in claim 26, wherein the distraction is performed using a distraction screw that extends along the long axis of at least one of the spinous processes.

28. A method as in claim 25, wherein the implant attaches to a first spinous process via a fastener that extends substantially along a long axis of the first spinous process.

29. A spinal implant device for controlling vertebral motion, comprising:

an attachment region adapted to attach to a first spinous process via a fastener that extends substantially along a long axis of the spinous process.

30. A spinal implant device for controlling vertebral motion, comprising:

an attachment region adapted to attach to a first spinous process via a fastener that extends substantially along a long axis of the lamina.

31. A spinal implant device for controlling vertebral motion, comprising:

an attachment region adapted to attach to a first spinous process via a fastener that extends toward a midline of the lamina.

32. A spinal implant device for controlling vertebral motion, comprising:

an attachment region adapted to attach to a first spinous process via a fastener that extends toward a superior aspect of the midline of the lamina.

33. A spinal implant device for controlling vertebral motion, comprising:

an attachment region adapted to attach to a first spinous process by clamping onto sides of the lamina on both sides of the vertebral midline.

34. A spinal implant device for controlling vertebral motion, comprising:

a first segment that attaches to a first vertebral body;

a second segment that attaches to a second vertebral body, the first and second segments being movable relative to one another to vary the length of the spinal implant; and

a spacer region that positions between first and second spinous processes of the first and second vertebral bodies.

35. A spinal implant device for controlling vertebral motion, comprising:

a spring formed of a coiled, elongated member, the spring extending along an axis and adapted to be positioned between a pair of spinous processes, wherein a first end of the elongate member attaches to a first spinous process and a second end attaches to a second spinous process.

36. A spinal implant device as in claim 35, wherein the spring has a diameter that limits extension of the spinous processes.