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MASS FLOW RATE CONTROL APPARATUS, ITS CALIBRATION METHOD AND SEMICONDUCTOR-PRODUCING APPARATUS

  • US 20070233412A1
  • Filed: 03/20/2007
  • Published: 10/04/2007
  • Est. Priority Date: 03/20/2006
  • Status: Active Grant
First Claim
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1. A mass flow controller having a path for flowing a fluid, comprising a calibrating valve disposed on the most upstream side of said path for opening or closing said path;

  • a mass flow rate control valve mechanism having such a changeable degree of opening that the mass flow rate of said fluid is equal to a set mass flow rate;

    a tank provided at said path upstream of said mass flow rate control valve mechanism;

    a means for sensing the mass flow rate of said fluid to output a mass flow rate signal;

    a means for sensing the pressure of said fluid to output a pressure signal; and

    a calibration control means for carrying out mass flow rate calibration using said calibrating valve, said tank, said mass-flow-rate-sensing means and said pressure-sensing means.

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