Anti-Gravity Device for Supporting Weight and Reducing Transmissibility

• US 20070236854A1
• Filed: 04/11/2006
• Published: 10/11/2007
• Est. Priority Date: 04/11/2006
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Yuan, Bausan, Lee, Martin, Makinouchi, Susumu
• Application Number:
  US11/279,296
• Publication Number:
  US 20070236854A1
• Time in Patent Office: Days
• US Class Current: 361/143
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.

Claims

1. An apparatus comprising:

a first structure;

a second structure, the second structure having at least one associated air bearing; and

an anti-gravity device, the anti-gravity device including a first magnet and a piston arrangement that includes a second magnet, the first magnet being coupled to the first structure, the piston arrangement being movably interfaced with the second structure through the associated air bearing, wherein the first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.

2. The apparatus of claim 1 wherein the first magnet has a first magnet pole of a first polarity and the second magnet has a second magnet pole of the first polarity, the first magnet pole and the second magnet pole being arranged such that the first magnet pole opposes the second magnet pole and an overall repulsive force is associated with the first magnet and the second magnet.

3. The apparatus of claim 2 wherein the piston arrangement has an area, the area being substantially filled with a vacuum, the vacuum having a vacuum force, the vacuum force being arranged to balance the overall repulsive force to support the first structure over the second structure.

4. The apparatus of claim 1 wherein the first magnet has at least one horizontal dimension that is larger than at least one horizontal dimension of the second magnet.

5. The apparatus of claim 1 wherein the second magnet has at least one horizontal dimension that is larger than at least one horizontal dimension of the first magnet.

6. The apparatus of claim 1 wherein the piston arrangement includes a piston and the second magnet is coupled to the piston.

7. The apparatus of claim 1 wherein the apparatus is a stage apparatus, and wherein the first structure is a fine stage and the second structure is a coarse stage.

8. An exposure apparatus comprising the stage apparatus of claim 7.

9. A device manufactured with the exposure apparatus of claim 8.

10. A wafer on which an image has been formed by the exposure apparatus of claim 8.

11. A stage apparatus comprising:

a first stage arrangement, the first stage arrangement being arranged to support an object to be positioned;

a second stage arrangement, the second stage arrangement having at least one associated air bearing; and

an anti-gravity device, the anti-gravity device including a first magnet and a piston arrangement that includes a second magnet, the first magnet being coupled to the first stage arrangement, the piston arrangement being movably interfaced with the second stage arrangement through the associated air bearing, wherein the first magnet and the piston arrangement cooperate to support the first stage arrangement over the second stage arrangement relative to a vertical axis such that the first stage arrangement may move with the second stage arrangement and independently of the second stage arrangement.

12. The stage apparatus of claim 11 wherein the first magnet has a first magnet pole of a first polarity and the second magnet has a second magnet pole of the first polarity, the first magnet pole and the second magnet pole being arranged such that the first magnet pole opposes the second magnet pole and an overall repulsive force is associated with the first magnet and the second magnet.

13. The stage apparatus of claim 12 wherein the piston arrangement has an area, the area being substantially filled with a vacuum, the vacuum having a vacuum force, the vacuum force being arranged to balance the overall repulsive force to support the first stage arrangement over the second stage arrangement.

14. The stage apparatus of claim 11 wherein the first magnet has at least one horizontal dimension that is not equal to a corresponding horizontal dimension of the second magnet.

15. The stage apparatus of claim 11 wherein the first stage arrangement is arranged to move in up to six degrees of freedom substantially independently of the second stage arrangement.

16. An exposure apparatus comprising the stage apparatus of claim 11.

17. A device manufactured with the exposure apparatus of claim 16.

18. A wafer on which an image has been formed by the exposure apparatus of claim 16, wherein the object is the wafer.

19. A method for controlling a vertical position of a first stage arrangement relative to a second stage arrangement, the first stage arrangement be supported in a vertical direction over the second stage arrangement by an anti-gravity device, the anti-gravity device including a first magnet coupled to the first stage arrangement and a piston arrangement that includes a second magnet, the piston arrangement being movably interfaced with the second stage arrangement through an air bearing, the first magnet being arranged substantially above the second magnet, the method comprising:

generating a magnet force relative to the first magnet and the second magnet; and

generating a balancing force in response to the magnet force, wherein the balancing force and the magnet force cooperate to support the first stage arrangement over the second stage arrangement.

20. The method of claim 19 wherein the magnet force is a repulsive force and the balancing force is a vacuum force.

21. A method for operating an exposure apparatus comprising the method for controlling the vertical position of the first stage arrangement of claim 19.

22. A method for making an object including at least a photolithography process, wherein the photolithography process utilizes the method of operating an exposure apparatus of claim 21.

23. A method for making a wafer utilizing the method of operating an exposure apparatus of claim 21.