Exposure condition setting method, semiconductor device manufacturing method, and exposure condition setting program

• US 20070238038A1
• Filed: 04/10/2007
• Published: 10/11/2007
• Est. Priority Date: 04/11/2006
• Status: Active Grant

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Fukuhara, Kazuya
• Granted Patent: US 7,807,323 B2
• Time in Patent Office: Days
• US Class Current: 430/30
• CPC Class Codes: G03F 7/701 Off-axis setting using an aperture
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

A method of optimally setting exposure conditions when light emitted from an effective light source is applied to a mask pattern formed on a mask for exposure and diffracted light emitted from the mask is projected onto a substrate via a projection lens to expose the substrate thereto, the method comprising defining an image evaluation amount which represents characteristics of an optical image or a resist pattern and which contains a factor indicating the influence of a dimensional error of the mask pattern on the image characteristics, determining an initial condition of the effective light source and the mask pattern, defining at least one of a parameter of the effective light source and a parameter of the mask pattern, and changing at least one of the parameters to calculate the image evaluation amount, and deciding an optimum parameter on the basis of the result of the calculation.

Claims

1. A method of optimally setting exposure conditions when light emitted from an effective light source is applied to a mask pattern formed on a mask for exposure and diffracted light emitted from the mask is projected onto a substrate via a projection lens to expose the substrate thereto, the method comprising:

defining an image evaluation amount which represents characteristics of an optical image or a resist pattern to be formed on the substrate and which contains a factor indicating the influence of a dimensional error of the mask pattern on the image characteristics;

determining an initial condition of the effective light source and an initial condition of the mask pattern;

defining at least one of a parameter indicating characteristics of the shape of the effective light source and a parameter indicating characteristics of the shape of the mask pattern; and

changing at least one of the parameters to calculate the image evaluation amount, and deciding an optimum parameter on the basis of the result of the calculation.

2. The method according to claim 1, wherein a factor M indicating the influence of the dimensional error of the mask pattern on the image characteristics is decided by

3. The method according to claim 2, wherein when the image evaluation amount represents the characteristics of the optical image, the image characteristic evaluation amount EL is indicated by

4. The method according to claim 2, wherein when the image evaluation amount represents the characteristics of the resist pattern, the image characteristic evaluation amount EL is indicated by

5. The method according to claim 1, wherein the image characteristic evaluation amount is defined, and a restrictive condition to be satisfied by the optical image or the resist pattern is set.

6. The method according to claim 5, wherein the optical image has transfer patterns and nontransfer patterns, and the nontransfer patterns maintain periodicity and are not transferred onto the substrate.

7. The method according to claim 1, wherein

the parameter indicating characteristics of the shape of the effective light source is defined by use of a dipole illumination.

8. The method according to claim 1, wherein

the parameter indicating characteristics of the shape of the effective light source is defined by use of a quadrupole illumination.

9. The method according to claim 1, wherein

the parameter indicating characteristics of the shape of the mask pattern is defined by use of a rigorous coupled wave analysis.

10. The method according to claim 1, wherein

the parameter indicating characteristics of the shape of the mask pattern is defined by use of a finite difference time domain.

11. The method according to claim 1, wherein

the parameter indicating characteristics of the shape of the mask pattern is defined by use of one or more of a ratio of the dimension of the mask for exposure to a pitch, and the refractive index and extinction coefficient of a light shielding member.

12. The method according to claim 1, wherein

the optimum parameter is found by a round robin algorithm.

13. The method according to claim 1, wherein

the optimum parameter is found by a simulated annealing method.

14. The method according to claim 1, wherein

the optimum parameter is found by a genetic algorithm.

15. The method according to claim 1, wherein

the effective light source is excimer laser.

16. The method according to claim 1, wherein

the excimer laser is applied to a liquid immersion exposure technique.

17. The method according to claim 1, wherein

the effective light source is EUV light.

18. The method according to claim 17, wherein

the mask for exposure and the projection lens are reflective.

19. A method of manufacturing a semiconductor device comprising carrying out exposure by use of a mask pattern and an illumination set by a method according to claim 1.

20. A program which causes a computer to execute a method of optimally setting exposure conditions when light emitted from an effective light source is applied to a mask pattern formed on a mask for exposure and diffracted light emitted from the mask is projected onto a substrate via a projection lens to expose the substrate thereto, the method comprising:

defining an image evaluation amount which represents characteristics of an optical image or a resist pattern to be formed on the substrate and which contains a factor indicating the influence of a dimensional error of the mask pattern on the image characteristics;

determining an initial condition of the effective light source and an initial condition of the mask pattern;

defining at least one of a parameter indicating characteristics of the shape of the effective light source and a parameter indicating characteristics of the shape of the mask pattern; and

changing at least one of the parameters to calculate the image evaluation amount, and causing the computer to decide an optimum parameter on the basis of the result of the calculation.