Epitaxial growth of compound nitride semiconductor structures

• US 20070240631A1
• Filed: 04/14/2006
• Published: 10/18/2007
• Est. Priority Date: 04/14/2006
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Nijhawan, Sandeep, Stevens, Ronald, Eaglesham, David, Washington, Lori, Smith, Jacob, Bour, David
• Application Number:
  US11/404,516
• Publication Number:
  US 20070240631A1
• Time in Patent Office: Days
• US Class Current: 117/98
• CPC Class Codes: C30B 25/14 Feed and outlet means for the gases; Modifying the flow of the reactive gases
• CPC Class Codes: C30B 29/403 AIII-nitrides
• CPC Class Codes: C30B 35/00 Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
• CPC Class Codes: H01L 21/0242 Crystalline insulating materials
• CPC Class Codes: H01L 21/02458 Nitrides
• CPC Class Codes: H01L 21/0254 Nitrides
• CPC Class Codes: H01L 21/0262 Reduction or decomposition of gaseous compounds, e.g. CVD
• CPC Class Codes: H01L 21/67155 Apparatus for manufacturing or treating in a plurality of work-stations

Abstract

Apparatus and methods are described for fabricating a compound nitride semiconductor structure. Group-III and nitrogen precursors are flowed into a first processing chamber to deposit a first layer over a substrate with a thermal chemical-vapor-deposition process. The substrate is transferred from the first processing chamber to a second processing chamber. Group-III and nitrogen precursors are flowed into the second processing chamber to deposit a second layer over the first layer with a thermal chemical-vapor-deposition process. The first and second group-III precursors have different group-III elements.

Claims

1. A method of fabricating a compound nitride semiconductor structure, the method comprising:

flowing a first group-III precursor and a first nitrogen precursor into a first processing chamber, the first group-III precursor comprising a first group-III element;

depositing a first layer over the substrate with a thermal chemical-vapor-deposition process within the first processing chamber using the first group-III precursor and the first nitrogen precursor, the first layer comprising nitrogen and the first group-III element;

transferring the substrate from the first processing chamber to a second processing chamber different from the first processing chamber after depositing the first layer;

flowing a second group-III precursor and a second nitrogen precursor into the second processing chamber, the second group-III precursor comprising a second group-III element not comprised by the first group-III precursor; and

depositing a second layer over the first layer with a thermal chemical-vapor-deposition process within the second processing chamber using the second group-III precursor and the second nitrogen precursor.

2. The method recited in claim 1 wherein transferring the substrate from the first processing chamber to the second processing chamber comprises transferring the substrate in an atmosphere having greater than 90% N₂.

3. The method recited in claim 1 wherein transferring the substrate from the first processing chamber to the second processing chamber comprises transferring the substrate in an atmosphere having greater than 90% NH₃.

4. The method recited in claim 1 wherein transferring the substrate from the first processing chamber to the second processing chamber comprises transferring the substrate in an atmosphere having greater than 90% H₂.

5. The method recited in claim 1 wherein transferring the substrate from the first processing chamber to the second processing chamber comprises transferring the substrate in an atmosphere having a temperature greater than 200°

C.

6. The method recited in claim 1 further comprising flowing a first carrier gas with the first group-III precursor and the first nitrogen precursor, wherein the first carrier gas is selected from the group consisting of N₂ and H₂.

7. The method recited in claim 6 further comprising flowing a second carrier gas with the second group-III precursor and the second nitrogen precursor, wherein the second carrier gas is selected from the group consisting of N₂ and H₂.

8. The method recited in claim 1 further comprising flowing a third group-III precursor into the second processing chamber with the second group-III precursor and the second nitrogen precursor, wherein the third group-III precursor comprises the first group-III element.

9. The method recited in claim 8 wherein:

the first group-III element is gallium;

the second group-III element is aluminum;

the first layer comprises a GaN layer; and

the second layer comprises an AlGaN layer.

10. The method recited in claim 8 wherein:

the first group-III element is gallium;

the second group-III element is indium;

the first layer comprises a GaN layer; and

the second layer comprises an InGaN layer.

11. The method recited in claim 8 wherein:

the first group-III element is gallium;

the second group-III element includes aluminum and indium;

the first layer comprises a GaN layer; and

the second layer comprises an AlInGaN layer.

12. The method recited in claim 1 wherein the first group-III precursor comprises a gallium precursor and the first layer comprises a GaN layer.

13. The method recited in claim 1 further comprising depositing a transition layer on the first layer in the second processing chamber before depositing the second layer, the transition layer having a chemical composition substantially the same as the first layer and having a thickness less than 10,000 Å

.

14. The method recited in claim 1 wherein the first processing chamber is adapted to provide rapid growth of material comprising nitrogen and a group-III element.

15. The method recited in claim 1 wherein the second processing chamber is adapted to provide enhanced uniformity of deposited material comprising nitrogen and a group-III element.

16. The method recited in claim 1 further comprising:

flowing a third group-III precursor and a third nitrogen precursor into a third processing chamber different from the first and second processing chambers, the third group-III precursor comprising a third group-III element;

depositing a third layer over a second substrate with a thermal chemical-vapor-deposition process within the third processing chamber using the third group-III precursor and the third nitrogen precursor, the third layer comprising nitrogen and the third group-III element;

transferring the substrate out of the second processing chamber; and

transferring the second substrate from the third processing chamber into the second processing chamber after transferring the substrate out of the second processing chamber to deposit a fourth layer over the third layer within the second processing chamber.

17. The method recited in claim 16 wherein the second processing chamber is not cleaned between transferring the substrate out of the second processing chamber and transferring the second substrate into the second processing chamber.

18. A method of fabricating a compound nitride semiconductor structure, the method comprising:

flowing a first gallium-containing precursor, a first nitrogen-containing precursor, and a first carrier gas into a first processing chamber, the first processing chamber being adapted to provide rapid growth of GaN;

depositing a GaN layer over the substrate with a thermal chemical-vapor-deposition process within the first processing chamber using the first gallium-containing precursor and the first nitrogen-containing precursor;

transferring the substrate from the first processing chamber to a second processing chamber in a high-purity atmosphere, the second processing chamber being adapted to provide enhanced uniformity of deposited material;

depositing a Ga transition layer having a thickness less than 10,000 Å

on the GaN layer in the second processing chamber;

flowing a second gallium-containing precursor, a group-III precursor, a second nitrogen-containing precursor, and a second carrier gas into the second processing chamber, the group-III precursor comprising a group-III element different from gallium; and

depositing an group-III-Ga—

N layer over the GaN transition layer with a thermal chemical-vapor-deposition process within the second processing chamber using the second gallium-containing precursor, the group-III precursor, and the second nitrogen-containing precursor.

19. The method recited in claim 18 wherein the group-III precursor is an aluminum-containing precursor and the group-III-Ga—

N layer is an AlGaN layer.

20. The method recited in claim 18 wherein the group-III precursor is an indium-containing precursor and the group-III-Ga—

N layer is an InGaN layer.

21. The method recited in claim 18 wherein the group-III precursor includes an aluminum-containing precursor and an indium-containing precursor and the group-III-Ga—

N layer is an AlInGaN layer.

22. A cluster tool comprising:

a first housing defining a first processing chamber that includes a first substrate holder;

a second housing defining a second processing chamber that includes a second substrate holder, the second processing chamber being different from the first processing chamber;

a robotic transfer system adapted to transfer substrates between the first and second substrate holders in a controlled environment;

a gas-delivery system configured to introduce gases into the first and second processing chambers;

a pressure-control system for maintaining selected pressures within the first and second processing chambers;

a temperature-control system for maintaining selected temperatures within the first and second processing chambers;

a controller for controlling the robotic transfer system the gas-delivery system, the pressure-control system, and the temperature-control system; and

a memory coupled to the controller, the memory comprising a computer-readable medium having a computer-readable program embodied therein for directing operation of the cluster tool, the computer-readable program including;

instructions to control the gas-delivery system to flow a first group-III precursor, a first nitrogen precursor, and a first carrier gas into the first processing chamber, the first group-III precursor comprising a first group-III element;

instructions to control the pressure-control system and the temperature-control system to deposit a first layer over the substrate with a thermal chemical-vapor-deposition process within the first processing chamber, the first layer comprising nitrogen and the first group-III element;

instructions to control the robotic transfer system to transfer the substrate from the first processing chamber to the second processing chamber after depositing the first layer;

instructions to control the gas-delivery system to flow a second group-III precursor, a second nitrogen precursor, and a second carrier gas into the second processing chamber, the second group-III precursor comprising a second group-III element not comprised by the first group-III precursor; and

instructions to control the pressure-control system and the temperature-control system to deposit a second layer over the first layer with a thermal chemical-vapor-deposition process within the second processing chamber.

23. The cluster tool recited in claim 22 wherein the substrate is transferred from the first processing chamber to the second processing chamber in an atmosphere having greater than 90% N₂, greater than 90% NH₃, or greater than 90% H₂.

24. The cluster tool recited in claim 22 wherein the substrate is transferred from the first processing chamber to the second processing chamber in an atmosphere having a temperature greater than 200°

C.

25. The cluster tool recited in claim 22 wherein the computer-readable program further includes instructions to control the gas-delivery system to flow a third group-III precursor into the second processing chamber with the second group-III precursor and the second nitrogen precursor, wherein the third group-III precursor comprises the first group-III element.

26. The cluster tool recited in claim 22 wherein:

the first group-III element is gallium;

the second group-III element is aluminum;

the first layer comprises a GaN layer; and

the second layer comprises an AlGaN layer.

27. The cluster tool recited in claim 22 wherein:

the first group-III element is gallium;

the second group-III element is indium;

the first layer comprises a GaN layer; and

the second layer comprises an InGaN layer.

28. The cluster tool recited in claim 22 wherein:

the first group-III element is gallium;

the second group-III element includes aluminum and indium;

the first layer comprises a GaN layer; and

the second layer comprises an AlInGaN layer.

29. The cluster tool recited in claim 22 wherein the computer-readable program further includes instructions to control the gas-delivery system, pressure-control system, and temperature-control system to deposit a transition layer on the first layer in the second processing chamber before depositing the second layer, the transition layer having a chemical composition substantially the same as the first layer.

30. The cluster tool recited in claim 22 wherein the first processing chamber is adapted to provide rapid growth of material comprising nitrogen and a group-III element.

31. The cluster tool recited in claim 22 wherein the second processing chamber is adapted to provide enhanced uniformity of deposited material comprising nitrogen and a group-III element.