Lithographic Apparatus and Device Manufacturing Method
First Claim
1. An apparatus, comprising:
- an illumination system that supplies a beam of radiation;
a patterning arrangement that patterns the beam;
a projection system that projects the patterned beam onto a target portion of a substrate; and
a grey scale modulator that supplies drive signals to the patterning arrangement to vary an intensity of respective parts of the patterned beam based on received error correction values, thereby compensating for errors in the projection system.
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Accused Products
Abstract
A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
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Citations
24 Claims
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1. An apparatus, comprising:
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an illumination system that supplies a beam of radiation;
a patterning arrangement that patterns the beam;
a projection system that projects the patterned beam onto a target portion of a substrate; and
a grey scale modulator that supplies drive signals to the patterning arrangement to vary an intensity of respective parts of the patterned beam based on received error correction values, thereby compensating for errors in the projection system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 19, 20, 21)
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12. A method, comprising:
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patterning a beam of radiation using an adjustable patterning arrangement;
projecting the patterned beam of radiation onto a target portion of a substrate using a projection system;
detecting errors in the projection system; and
supplying drive signals to the patterning arrangement based on the detected errors to vary an intensity of respective portions of the patterned beam, thereby compensating for the effect of errors in the projection system. - View Dependent Claims (13, 14, 15, 16, 17, 18, 22)
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23. A method for calibrating a patterning device, comprising:
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(a) measuring positioning errors of image spots;
(b) correcting the positioning errors by adjusting a grey level of a pair of adjacent spots in the image spots; and
(c) calibrating a nominal intensity of each of the image spots. - View Dependent Claims (24)
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Specification