EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
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Abstract
There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
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Citations
62 Claims
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1-33. -33. (canceled)
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34. A lithographic apparatus, comprising:
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a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam of radiation onto the substrate, the projection system comprising a final optical element adjacent the substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table; and
a cleaning device configured to clean the final optical element, the substrate table, or both. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53)
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54. A lithographic apparatus, comprising:
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a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam of radiation onto the substrate, the projection system comprising a final optical element adjacent the substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table; and
a coater configured to coat the final optical element, the substrate table, or both. - View Dependent Claims (55, 56, 57)
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58. The use of a fluid supply system in a lithographic apparatus for the in-line application of (i) a cleaning fluid, (ii) a coating fluid, (iii) a coating remover, or (iv) any combination of (i)-(iii), to a space between a projection system and a substrate table of the lithographic apparatus.
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59. A spray unit configured to spray a cleaning fluid onto a final optical element of a lithographic apparatus projection system.
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60. An ultrasonic emitter configured to turn a liquid confined in a space between a projection system and a substrate table of lithographic apparatus into an ultrasonic cleaning liquid.
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61. A method of cleaning a projection system optical element, a substrate table, or both, in a lithographic apparatus configured to have a liquid in a space between the optical element and the substrate table, the method comprising circulating a cleaning fluid through the space.
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62. A method of coating a projection system optical element, a substrate table, or both, in a lithographic apparatus configured to have a liquid in a space between the optical element and the substrate table, the method comprising circulating a coating fluid through the space.
Specification