Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity

• US 20070242252A1
• Filed: 04/12/2006
• Published: 10/18/2007
• Est. Priority Date: 04/12/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Tinnemans, Patricius
• Granted Patent: US 7,508,491 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A lithography method and system comprise an array of individually controllable elements, a first datapath section, a second datapath section, and a quantization device. The array of individually controllable elements modulates a beam of radiation.. The first datapath section converts data defining a requested dose pattern into a stream of setpoint data defining a desired sequence of setpoints for the array of individually controllable elements. The second datapath section stores and reproduces the stream of setpoint data for the array of individually controllable elements. The quantization device digitizes the stream of setpoint data before it is passed from the first datapath section to the second datapath section. The first datapath section further comprises a noise controller configured to incorporate noise of a predetermined magnitude into the stream of setpoint data before it is digitized by the quantization device.

Claims

1. A lithography apparatus, comprising:

an array of individually controllable elements that are configured to modulate a beam of radiation;

a first datapath section that is configured to convert data defining a requested dose pattern into a stream of setpoint data defining a sequence of setpoints for the array of individually controllable elements and that comprises a noise controller that is configured to incorporate noise of a predetermined magnitude into the stream of setpoint data;

a second datapath section configured to store and reproduce the stream of setpoint data for the array of individually controllable elements; and

a quantization device configured to digitize the stream of setpoint data before it is transmitted from the first datapath section to the second datapath section.

2. The lithographic apparatus of claim 1, wherein:

the noise incorporated by the noise controller for a setpoint in the sequence of setpoints corresponding to a first element of the array of individually controllable elements is substantially independent from the noise incorporated for setpoints in the sequence of setpoints that correspond to elements surrounding the first element of the array of individually controllable elements.

3. The lithographic apparatus of claim 2, wherein:

the surrounding elements comprise at least those elements whose radiation patterns overlap significantly with a radiation pattern from the first element.

4. The lithographic apparatus of claim 1, wherein:

the noise comprises at least one of white noise, pseudo-white noise, and artificially generated noise that is spatially noisy at least with respect to setpoints for neighboring elements of the array of individually controllable elements, such that the noise incorporated for a first element in the array of controllable elements is substantially uncorrelated with noise applied for elements in the array of individually controllable elements that neighbor the first element.

5. The lithographic apparatus of claim 1, wherein:

the predetermined magnitude is about one least significant bit of the setpoint data.

6. The lithographic apparatus of claim 1, wherein:

the first datapath section is configured to operate substantially offline.

7. The lithographic apparatus of claim 1, wherein:

the second datapath section is configured to operate substantially online.

8. The lithographic apparatus of claim 1, wherein:

the noise controller is configured to amplify noise already present in the stream of setpoint data to the predetermined magnitude.

9. The lithographic apparatus of claim 1, wherein the second datapath section comprises:

a digital-to-analog converter configured to convert the digitized stream of setpoint data to an analog stream of setpoint data; and

a noise removal device configured to at least partly remove from the analog stream of setpoint data noise that was added by the noise controller.

10. A device manufacturing method, comprising:

converting data defining a requested dose pattern to a stream of setpoint data defining a desired sequence of setpoints of an array of individually controllable elements;

incorporating noise into the stream of setpoint data;

digitizing the stream of setpoint data;

storing the stream of setpoint data;

reproducing the stream of setpoint data, such that the array of individually controllable elements modulates a beam of radiation based on the stream of setpoint data; and

projecting the modulated beam onto a substrate.

11. A flat panel display manufactured according to the method of claim 10.

12. An integrated circuit device manufactured according to the method of claim 10.