ELECTRONIC APPLIANCE INCLUDING TRANSISTOR HAVING LDD REGION
First Claim
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1. A semiconductor device comprising:
- a semiconductor film being formed over an insulating surface;
a gate insulating film over the semiconductor film; and
a gate electrode comprising;
a first conductive layer over the gate insulating film; and
a second conductive layer over the first conductive layer;
wherein the semiconductor film includes, a channel forming region, LDD regions in contact with the channel forming region, a source region and a drain region in contact with the LDD regions, wherein an end portion of the first conductive layer extends beyond an end portion of the second conductive layer, wherein the LDD regions overlap the first conductive layer with the gate insulating film interposed therebetween, wherein the first conductive layer comprises at least a first element selected from the group consisting of Ta, W, Ti, Mo, Al, and Cu and the second conductive layer comprises at least a second element selected from the group consisting of Ta, W, Ti, Mo, Al, and Cu, and wherein the first element is different from the second element.
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Abstract
A high reliability semiconductor display device is provided. A semiconductor layer in the semiconductor display device has a channel forming region, an LDD region, a source region, and a drain region, and the LDD region overlaps a first gate electrode, sandwiching a gate insulating film.
43 Citations
20 Claims
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1. A semiconductor device comprising:
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a semiconductor film being formed over an insulating surface;
a gate insulating film over the semiconductor film; and
a gate electrode comprising;
a first conductive layer over the gate insulating film; and
a second conductive layer over the first conductive layer;
wherein the semiconductor film includes, a channel forming region, LDD regions in contact with the channel forming region, a source region and a drain region in contact with the LDD regions, wherein an end portion of the first conductive layer extends beyond an end portion of the second conductive layer, wherein the LDD regions overlap the first conductive layer with the gate insulating film interposed therebetween, wherein the first conductive layer comprises at least a first element selected from the group consisting of Ta, W, Ti, Mo, Al, and Cu and the second conductive layer comprises at least a second element selected from the group consisting of Ta, W, Ti, Mo, Al, and Cu, and wherein the first element is different from the second element. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device comprising:
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a semiconductor film being formed over an insulating surface;
a gate insulating film over the semiconductor film; and
a gate electrode comprising;
a first conductive layer over the gate insulating film; and
a second conductive layer over the first conductive layer;
wherein the semiconductor film comprises;
a channel forming region, LDD regions in contact with the channel forming region, and a source region and a drain region in contact with the LDD regions, wherein an end portion of the first conductive layer extends beyond an end portion of the second conductive layer, wherein the LDD regions overlap the first conductive layer with the gate insulating film interposed therebetween, wherein the first conductive layer has a tapered shape in cross section in an end portion with a first taper angle, wherein the second conductive layer has a tapered shape in cross section in an end portion with a second taper angle, and wherein the first taper angle is different from the second taper angle. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A semiconductor device comprising:
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a semiconductor film being formed over an insulating surface;
a gate insulating film over the semiconductor film; and
a gate electrode comprising;
a first conductive layer over the gate insulating film; and
a second conductive layer over the first conductive layer, wherein the semiconductor film comprises;
a channel forming region, LDD regions in contact with the channel forming region, a source region and a drain region in contact with the LDD regions, wherein the gate insulating film overlaps the source region and the drain region, wherein an end portion of the first conductive layer extends beyond an end portion of the second conductive layer, wherein the LDD regions overlap the first conductive layer with the gate insulating film interposed therebetween, and wherein a part of the gate insulating film overlapped with the first conductive layer is thicker than a part of the gate insulating film overlapped with one of the source region and the drain region of the semiconductor layer and not overlapped with the first conductive layer. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification