Cleanup method for optics in immersion lithography
First Claim
1. A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam of radiation onto the substrate, the projection system comprising a final optical element adjacent the substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table; and
a cleaning device configured to clean the final optical element, the substrate table, or both.
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Abstract
An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.
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Citations
29 Claims
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1. A lithographic apparatus, comprising:
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a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam of radiation onto the substrate, the projection system comprising a final optical element adjacent the substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table; and
a cleaning device configured to clean the final optical element, the substrate table, or both. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A lithographic apparatus, comprising:
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a substrate table configured to hold a substrate;
a projection system configured to project a patterned beam of radiation onto the substrate, the projection system comprising a final optical element adjacent the substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table; and
a coater configured to coat the final optical element, the substrate table, or both. - View Dependent Claims (22, 23, 24)
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25. The use of a fluid supply system in a lithographic apparatus for the in-line application of (i) a cleaning fluid, (ii) a coating fluid, (iii) a coating remover, or (iv) any combination of (i)-(iii), to a space between a projection system and a substrate table of the lithographic apparatus.
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26. A spray unit configured to spray a cleaning fluid onto a final optical element of a lithographic apparatus projection system.
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27. An ultrasonic emitter configured to turn a liquid confined in a space between a projection system and a substrate table of lithographic apparatus into an ultrasonic cleaning liquid.
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28. A method of cleaning a projection system optical element, a substrate table, or both, in a lithographic apparatus configured to have a liquid in a space between the optical element and the substrate table, the method comprising circulating a cleaning fluid through the space.
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29. A method of coating a projection system optical element, a substrate table, or both, in a lithographic apparatus configured to have a liquid in a space between the optical element and the substrate table, the method comprising circulating a coating fluid through the space.
Specification