System and Method for Forming Multi-Component Films
First Claim
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1. A flash MOCVD system, comprising:
- a reaction chamber;
a substrate assembly positioned within the reaction chamber;
a flash evaporator for vaporizing a reactant material to form a reactant gas;
a gas distribution system for uniformly distributing the reactant gas to the substrate assembly.
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Abstract
A system and a method for depositing films of a multi-component material by MOCVD utilizes a flash evaporator for providing vaporized reactant material at a high flow rate. The high flow rate enables film deposition to occur at a higher deposition rate that what is possible with conventional MOCVD systems. The system may be a single-chamber system or part of a multiple-chamber system. The multiple-chamber system allows multi-layer structures to be deposited and/or processed in situ.
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Citations
70 Claims
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1. A flash MOCVD system, comprising:
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a reaction chamber;
a substrate assembly positioned within the reaction chamber;
a flash evaporator for vaporizing a reactant material to form a reactant gas;
a gas distribution system for uniformly distributing the reactant gas to the substrate assembly. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 59, 60)
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36. A process for forming lithium niobate by MOCVD, the process comprising the steps of:
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preparing a precursor solution containing at least a Li-bearing precursor, a Nb-bearing precursor, and a solvent;
using a flash evaporator to vaporize the solution to produce a reactant gas;
delivering the reactant gas to a heated substrate; and
decomposing the reactant gas on the substrate to deposit a crack-free film of lithium niobate greater that 1.5 μ
m in thickness. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52)
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53. A process for forming a film by MOCVD, the process comprising the steps of:
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preparing a precursor solution containing at least a precursor land a solvent;
using a flash evaporator to vaporize the solution to produce a reactant gas;
delivering the reactant gas to a heated substrate; and
decomposing the reactant gas on the substrate to deposit a crack-free film. - View Dependent Claims (54, 55, 56, 57, 58)
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61. A process for forming a pn junction, comprising the steps of:
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using a first chamber of a multi-chamber deposition system to grow a film of ZnO;
transporting the film of ZnO to a second chamber of the multi-chamber deposition system without exposing the film of ZnO to atmospheric conditions; and
using the second chamber of the multi-chamber deposition system to anneal the film of ZnO. - View Dependent Claims (62, 63, 64, 65, 66, 67, 68, 69, 70)
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Specification