Material, particularly for an optical component for use in microlithography, and method for making a blank from the material
First Claim
1. A material for an optical component, said material comprising:
- synthetically produced quartz crystallites that form a polycrystalline structure and that have a mean grain size in a range between 500 nm and 30 μ
m.
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Abstract
The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for Making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.
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Citations
20 Claims
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1. A material for an optical component, said material comprising:
- synthetically produced quartz crystallites that form a polycrystalline structure and that have a mean grain size in a range between 500 nm and 30 μ
m. - View Dependent Claims (2, 3, 4, 15, 16, 17, 18)
- synthetically produced quartz crystallites that form a polycrystalline structure and that have a mean grain size in a range between 500 nm and 30 μ
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5. A method for making a material, for an optical component said method comprising:
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providing granules of synthetically produced quartz crystals having a mean grain size in a range between 500 nm and 30 μ
m, andsintering the granules to obtain a blank of polycrystalline quartz. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13, 14, 19, 20)
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Specification