IMAGE DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
First Claim
1. An image display device comprising a plurality of gate lines formed on an insulating substrate, a plurality of signal lines formed to cross said plurality of gate lines in a matrix fashion, and a plurality of thin-film transistors,wherein said plurality of gate lines have a laminated structure, said plurality of thin-film transistors include transistors of two types of an n-channel conductivity type and a p-channel conductivity type, gate electrodes of thin-film transistors of one type are laminated electrodes of the same configuration as said gate lines, and gate electrodes of thin-film transistors of the other type are electrodes of the same layer as bottom electrodes of said gate lines.
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Accused Products
Abstract
An image display device of reduced cost is provided. A plurality of gate lines, a plurality of signal lines formed to cross the gate lines in a matrix fashion, and a plurality of thin-film transistors are formed on an insulating substrate, and the plurality of gate lines are laminated electrodes. The plurality of thin-film transistors are configured of transistors of two types of an n-channel conductivity type and a p-channel conductivity type. Gate electrodes of thin-film transistors of one type are laminated electrodes of the same configuration as the gate lines, and gate electrodes of thin-film transistors of the other type are configured of electrodes of the same layer as bottom electrodes of the gate lines.
51 Citations
13 Claims
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1. An image display device comprising a plurality of gate lines formed on an insulating substrate, a plurality of signal lines formed to cross said plurality of gate lines in a matrix fashion, and a plurality of thin-film transistors,
wherein said plurality of gate lines have a laminated structure, said plurality of thin-film transistors include transistors of two types of an n-channel conductivity type and a p-channel conductivity type, gate electrodes of thin-film transistors of one type are laminated electrodes of the same configuration as said gate lines, and gate electrodes of thin-film transistors of the other type are electrodes of the same layer as bottom electrodes of said gate lines.
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3. An image display device comprising a plurality of gate lines formed on an insulating substrate, a plurality of signal lines formed to cross said plurality of gate lines in a matrix fashion, and a plurality of thin-film transistors,
wherein said plurality of gate lines have a laminated structure, pixel electrodes are provided in a region surrounded by said plurality of gate lines and said plurality of signal lines, said plurality of thin-film transistors include transistors of two types of an n-channel conductivity type and a p-channel conductivity type, gate electrodes of thin-film transistors of one type are of the same material as said pixel electrodes, and gate electrodes of thin-film transistors of the other type have a laminated structure of a layer of the same material as said gate lines and a layer of the same material as said pixel electrodes.
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13. (canceled)
Specification