Substrate Holder, Stage Apparatus, and Exposure Apparatus

• US 20070252970A1
• Filed: 08/29/2005
• Published: 11/01/2007
• Est. Priority Date: 09/01/2004
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Application Number:
  US11/661,372
• Publication Number:
  US 20070252970A1
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions

Abstract

An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part (33) that surrounds a suction space (38), and a first support part (34) that is provided in the suction space (38) and that supports a substrate. Furthermore, the invention is equipped with a second support part (7) that extends from the circumferential edge part (33) to the first support part (34) and that supports the substrate.

Claims

1. A substrate holder that comprises:

a circumferential edge part that surrounds a suction space; and

a first support part that is provided in the suction space and that supports a substrate;

comprising;

a second support part that extends from the circumferential edge part to the first support part and that supports the substrate.

2. A substrate holder according to claim 1, wherein

a plurality of the second support parts is provided, the lengths of which extend from the circumferential edge part to the first support part and vary.

3. A substrate holder according to claim 1, wherein

the support surface area whereon the substrate is supported by the second support part is larger than the support surface area whereon the substrate is supported by the first support part.

4. A substrate holder according to claim 1, wherein

a plurality of the first support parts is provided.

5. A substrate holder according to claim 1, wherein

the first support parts constitute a pin chuck.

6. A substrate holder according to claim 1, wherein

at least one of the first support part and the second support part is given water repellency treatment.

7. A substrate holder according to claim 1, wherein

the second support part is made of a ceramic material.

8. A substrate holder according to claim 1, wherein

the second support part is radially provided.

9. A substrate holder according to claim 1, wherein

the circumferential edge part and the second support part are formed integrally.

10. A substrate holder according to claim 1, wherein

the height of the first support part is the same as the height of the second support part.

11. A substrate holder according to claim 9, wherein

the height of the first and second support parts is the same as the height of the circumferential edge part.

12. A stage apparatus that holds and moves a substrate, comprising:

a substrate holder, which serves as a substrate holder that holds the substrate, according to claim 1.

13. A stage apparatus according to claim 12, wherein

a reflecting part is provided to an end surface of the substrate holder.

14. An exposure apparatus that uses a stage apparatus to expose a substrate with a pattern, wherein

a stage apparatus according to claim 12 is used as the stage apparatus.

15. An exposure apparatus according to claim 14, wherein

exposure is performed in a state wherein a liquid is filled between the substrate and a projection optical system, which projects the pattern onto the substrate.