VARIABLE LENS AND EXPOSURE SYSTEM

• US 20070253070A1
• Filed: 04/25/2007
• Published: 11/01/2007
• Est. Priority Date: 04/15/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Venema, Willem
• Granted Patent: US 7,460,309 B2
• Time in Patent Office: Days
• US Class Current: 359/619
• CPC Class Codes: G02B 26/005 based on electrowetting
• CPC Class Codes: G02B 3/0012 characterised by the manufacturing method
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G02B 3/14 of variable focal length
• CPC Class Codes: G03F 7/70266 Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

A lithography apparatus comprises variable lenses.

Claims

1. A microlens array, comprising:

a matrix of lenses; and

a first liquid and a second liquid associated with the matrix of lenses,

wherein the first liquid and the second liquid are substantially immiscible and have different refractive indices.

2. The microlens array of claim 1, wherein the first liquid is an aqueous liquid.

3. The microlens array of claim 1, wherein the second liquid is an oil.

4. The microlens array of claim 1, wherein the microlens array comprises at least 100 of the lenses.

5. The microlens array of claim 1 included in a lithography system.

6. A lithography apparatus, comprising:

an illumination system;

a patterning device;

a projection system; and

a microlens array, comprising,

a matrix of lenses; and

a first liquid and a second liquid associated with the matrix of lenses,

wherein the first liquid and the second liquid are substantially immiscible and have different refractive indices.

7. A device manufacturing method, comprising:

providing a microlens array;

providing a matrix of lenses in the microlens array, the matrix of lenses having a first liquid and a second liquid, wherein the first liquid and the second liquid are substantially immiscible and have different refractive indices; and

exposing a substrate to radiation using the microlens array.

8. The method of claim 7, comprising controlling a focal position of lenses in the microlens array by applying a voltage to the lenses.

9. The method of claim 8, wherein the voltage is applied to the individual lenses using a data/address scheme.