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Process monitoring apparatus and method for monitoring process

  • US 20070254384A1
  • Filed: 06/29/2007
  • Published: 11/01/2007
  • Est. Priority Date: 10/31/2002
  • Status: Active Grant
First Claim
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9. A method for monitoring a process in a process chamber comprising the acts of:

  • introducing a monitor element into the process chamber, the monitor element comprising a semiconductor wafer having formed thereon a plurality of sensors, a data memory, and a read only memory;

    sensing a condition in the process chamber using the sensors and storing data representing said condition in the data memory;

    reading a keyword stored in the read only memory; and

    reading data in the data memory only after successfully reading the keyword.

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