Lithographic apparatus and device manufacturing method using interferometric and other exposure
First Claim
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1. A lithographic apparatus for exposing a pattern on a substrate, comprising:
- a substrate support that is configured to support a substrate;
an exposure unit that is configured to project two beams of radiation onto the substrate, such that the two beams of radiation interfere with each other to expose parallel lines on respective target areas of the substrate; and
an actuator that is configured to continuously move the substrate support relative to the exposure unit during exposure of the parallel lines on the respective target areas of the substrate.
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Abstract
A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.
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Citations
34 Claims
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1. A lithographic apparatus for exposing a pattern on a substrate, comprising:
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a substrate support that is configured to support a substrate;
an exposure unit that is configured to project two beams of radiation onto the substrate, such that the two beams of radiation interfere with each other to expose parallel lines on respective target areas of the substrate; and
an actuator that is configured to continuously move the substrate support relative to the exposure unit during exposure of the parallel lines on the respective target areas of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. A device manufacturing method, comprising:
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using an exposure unit to project two beams of radiation onto a substrate supported on a substrate support, such that the two beams of radiation interfere with each other to expose parallel lines on respective target areas of the substrate; and
continuously moving the substrate support relative to the exposure unit, while the parallel lines are exposed on the respective target areas on the substrate by the exposure unit. - View Dependent Claims (33, 34)
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Specification