×

Lithographic apparatus and device manufacturing method using interferometric and other exposure

  • US 20070258078A1
  • Filed: 05/04/2006
  • Published: 11/08/2007
  • Est. Priority Date: 05/04/2006
  • Status: Active Grant
First Claim
Patent Images

1. A lithographic apparatus for exposing a pattern on a substrate, comprising:

  • a substrate support that is configured to support a substrate;

    an exposure unit that is configured to project two beams of radiation onto the substrate, such that the two beams of radiation interfere with each other to expose parallel lines on respective target areas of the substrate; and

    an actuator that is configured to continuously move the substrate support relative to the exposure unit during exposure of the parallel lines on the respective target areas of the substrate.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×