APPARATUS AND METHOD FOR INSPECTING MASK FOR USE IN FABRICATING AN INTEGRATED CIRCUIT DEVICE
First Claim
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1. A mask inspection apparatus for detecting defects in a semiconductor pattern on a mask for use in fabricating an IC (Integrated Circuit) device, the apparatus comprising:
- an image combiner for receiving a mask image produced by a light beam incident on the mask and for receiving a reference beam, for combining the mask image with the reference beam to form a combined image, and for directing the combined image along a same path, wherein the mask image includes a waveform that is responsive to the semiconductor pattern on the mask;
a second-order non-linear optical system for receiving the combined image, which comprises the mask image and the reference beam, from the image combiner and for increasing the intensity of one of the mask image and the reference beam; and
an inspection unit for determining whether a defect is present in the semiconductor pattern on the mask by inspecting images, which are responsive to the combined image, exiting the second-order non-linear optical system.
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Abstract
In an embodiment, a mask inspection apparatus for detecting defects in a semiconductor pattern on a mask includes optics for combining light transmitted through or reflected from the mask with a reference beam. The two light beams are transmitted through a second-order non-linear optical system. Mask defects affect the transmitted/reflected light and may be detected by analyzing the transmitted light intensity. The second-order non-linear optical system amplifies selected elements of the combined beam, thus improving detection.
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Citations
22 Claims
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1. A mask inspection apparatus for detecting defects in a semiconductor pattern on a mask for use in fabricating an IC (Integrated Circuit) device, the apparatus comprising:
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an image combiner for receiving a mask image produced by a light beam incident on the mask and for receiving a reference beam, for combining the mask image with the reference beam to form a combined image, and for directing the combined image along a same path, wherein the mask image includes a waveform that is responsive to the semiconductor pattern on the mask; a second-order non-linear optical system for receiving the combined image, which comprises the mask image and the reference beam, from the image combiner and for increasing the intensity of one of the mask image and the reference beam; and an inspection unit for determining whether a defect is present in the semiconductor pattern on the mask by inspecting images, which are responsive to the combined image, exiting the second-order non-linear optical system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 11, 12, 13, 14)
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- 8. The apparatus of claim i, further comprising an image separator for separating the images exiting the second-order non-linear optical system according to wavelength and for projecting the separate images onto the inspection unit.
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15. A mask inspection method for detecting defects in a semiconductor pattern on a mask for use in fabricating an IC (Integrated Circuit) device, the method comprising:
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irradiating light onto the mask; combining a mask image leaving the mask with a reference beam; increasing the intensity of the combined images as they pass through the second-order non-linear optical system; separating the images exiting the second-order non-linear optical system according to wavelength; and inspecting the separated images. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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22. A mask inspection apparatus for detecting defects in a semiconductor pattern on a mask for use in fabricating an IC (Integrated Circuit) device, the apparatus comprising:
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a second-order non-linear optical system for receiving a mask image and a reference beam having a wavelength that is double that of the mask image, wherein the mask image is responsive to the semiconductor pattern; and an inspection unit for determining whether a defect is present in the semiconductor pattern on the mask by inspecting images exiting the second-order non-linear optical system.
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Specification