Analysis of a reactive gas such as silane for particle generating impurities
First Claim
1. In a manufacturing process comprising supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas, the improvement wherein a particle counter and/or particle capture filter samples a flow of the gas upstream of the processing apparatus to detect an amount of the contaminating particles suspended in the flow of the gas, and a signal is generated when the amount of the contaminating particles is in excess of a predetermined amount.
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Abstract
An improved process for supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas is disclosed. The improvement includes sampling a flow of the gas upstream of the processing apparatus with a particle counter and/or particle capture filter to detect an amount of the contaminating particles in the flow of the gas, and generating a signal when the amount of particles is in excess of a predetermined amount. An apparatus for performing the process includes: a supply source; at least one processing tool; a particle counter upstream of the processing tool and downstream of the supply source; a microprocessor in electrical communication with at least the particle counter; and optionally a particle capture filter in parallel with the particle counter. The process and apparatus are useful in the manufacture of integrated circuits.
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Citations
22 Claims
- 1. In a manufacturing process comprising supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas, the improvement wherein a particle counter and/or particle capture filter samples a flow of the gas upstream of the processing apparatus to detect an amount of the contaminating particles suspended in the flow of the gas, and a signal is generated when the amount of the contaminating particles is in excess of a predetermined amount.
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17. In an integrated circuit manufacturing process comprising supplying gaseous silane to a processing apparatus, the improvement wherein at least one of a particle counter and a particle capture filter samples a flow of the silane upstream of the processing apparatus to detect an amount of contaminating particles suspended in the flow of the silane, and a signal is generated when the amount of contaminating particles is in excess of a predetermined amount.
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18. An apparatus for maintaining a purity level of a gas feed stream of a processing apparatus at or above a minimum acceptable purity level, said apparatus comprising:
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a supply source for supplying the gas;
at least one processing tool in fluid communication with the supply source and adapted to use the gas to perform a processing function;
a particle counter placed upstream of the processing tool and downstream of the supply source;
a microprocessor in electrical communication with at least the particle counter; and
optionallya particle capture filter arranged in parallel with the particle counter upstream of the processing tool and downstream of the supply source. - View Dependent Claims (19, 20, 21, 22)
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Specification