Exposure apparatus, exposure method, and method for producing device

• US 20070263185A1
• Filed: 07/18/2007
• Published: 11/15/2007
• Est. Priority Date: 02/26/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Owa, Soichi, Nagasaka, Hiroyuki, Nishii, Yasufumi
• Granted Patent: US 7,911,583 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/7095 Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

Abstract

An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system. The liquid supply mechanism is isolated from the projection optical system in terms of vibration.

Claims

1. An exposure apparatus which exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate; and

a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, wherein;

the liquid supply mechanism is isolated from the projection optical system in terms of vibration.

2. The exposure apparatus according to claim 1, wherein the liquid supply mechanism has supply ports disposed on both sides of the projection area onto which the pattern image is projected, and the liquid is supplied onto the substrate simultaneously on the both sides of the projection area.

3. The exposure apparatus according to claim 2, wherein shot areas on the substrate are respectively exposed while being moved in a predetermined scanning direction, and the liquid supply mechanism supplies the liquid simultaneously from the both sides of the projection area in relation to the scanning direction.

4. The exposure apparatus according to claim 1, further comprising a liquid recovery mechanism which recovers the liquid on the substrate, wherein the liquid recovery mechanism is isolated from the projection optical system in terms of vibration.

5. The exposure apparatus according to claim 4, wherein a recovery port of the liquid recovery mechanism is arranged so that a supply port of the liquid supply mechanism is surrounded thereby.

6. The exposure apparatus according to claim 1, further comprising a first support member which supports the projection optical system, and a second support member which is isolated from the first support member in terms of vibration and which supports the liquid supply mechanism.

7. The exposure apparatus according to claim 6, wherein an anti-vibration mechanism is arranged between the first support member and the second support member.

8. The exposure apparatus according to claim 6, further comprising a laser interferometer which is supported by the first support member and which measures position information about a substrate stage which is movable while holding the substrate.

9. The exposure apparatus according to claim 6, further comprising a base member which supports a substrate stage which is movable while holding the substrate, wherein the second support member is isolated from the base member in terms of vibration.

10. A method for producing a device, comprising using the exposure apparatus as defined in claim 1.

11. An exposure apparatus which exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate; and

a liquid recovery mechanism which recovers the liquid supplied onto a part of the substrate including a projection area of the projection optical system, wherein;

the liquid recovery mechanism is isolated from the projection optical system in terms of vibration.

12. The exposure apparatus according to claim 11, further comprising a first support member which supports the projection optical system, and a second support member which is isolated from the first support member in terms of vibration and which supports the liquid recovery mechanism.

13. The exposure apparatus according to claim 12, wherein an anti-vibration mechanism is arranged between the first support member and the second support member.

14. The exposure apparatus according to claim 12, further comprising a laser interferometer which is supported by the first support member and which measures position information about a substrate stage which is movable while holding the substrate.

15. The exposure apparatus according to claim 12, further comprising a base member which supports a substrate stage which is movable while holding the substrate, wherein the second support member is isolated from the base member in terms of vibration.

16. A method for producing a device, comprising using the exposure apparatus as defined in claim 12.