Lithographic apparatus and device manufacturing method

• US 20070263189A1
• Filed: 05/09/2006
• Published: 11/15/2007
• Est. Priority Date: 05/09/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Butler, Hans, Auer, Frank
• Granted Patent: US 7,936,443 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: H01L 21/0274 Photolithographic processes

Abstract

Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.

Claims

1. A lithographic apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a frame constructed to hold said projection system;

a mount constructed to support said projection system on said frame, said mount comprising a piezo-electric actuator constructed to apply a force to said projection system;

a sensor constructed to measure the position or a time derivative of the position of said frame,

wherein said piezo-electric actuator is controlled based on the measured position or a time derivative of said position of said frame.

2. A lithographic apparatus according to claim 1, wherein said mount further comprises a piezo-electric sensor constructed to measure the force between said frame and said projection system.

3. A lithographic apparatus according to claim 2, wherein said piezo-electric sensor is arranged in series with said piezo-electric actuator.

4. A lithographic apparatus according to claim 1, wherein said mount comprises a plurality of piezo-electric actuators.

5. A lithographic apparatus according to claim 4, wherein said mount further comprises a plurality of piezo-electric sensors constructed to measure the force between said frame and said projection system, each piezo-electric actuator being arranged in series with a piezo-electric sensor.

6. A lithographic apparatus according to claim 1, wherein said sensor comprises a velocity sensor and wherein said piezo-electric actuator is controlled based on the measured velocity of said frame.

7. A lithographic apparatus according to claim 6, wherein said velocity sensor is geophone.

8. A lithographic apparatus according to claim 1, wherein said sensor comprises an acceleration sensor and wherein said piezo-electric actuator is controlled based on the measured acceleration of said frame.

9. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate using a projection system;

holding said projection system using a frame;

supporting said projection system on said frame using a mount, said mount comprising a piezo-electric actuator constructed to apply a force to said projection system;

measuring the position or a time derivative of the position of said frame; and

controlling said piezo-electric actuator based on the measured position or time derivative of the position of said frame.

10. A lithographic apparatus comprising:

a support constructed to support a patterning device to pattern a radiation beam;

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned beam onto a target portion of said substrate;

a frame constructed to hold said projection system; and

a mount constructed to support said projection system on said frame, said mount comprising a piezo-electric sensor constructed to detect a force applied to said projection system,

wherein a position of said support and/or said substrate table is/are controlled based on said detected force.

11. A lithographic apparatus according to claim 10, wherein said piezo-electric sensor detects the force applied in six directions.

12. A lithographic apparatus according to claim 10, wherein said mount comprises a plurality of piezo-electric sensors.

13. A lithographic apparatus according to claim 10, where said mount further comprises a piezo-electric actuator constructed to apply a force to said projection system.

14. A device manufacturing method comprising:

holding a patterning device that is configured to pattern a radiation beam using a support;

holding a substrate using a substrate table;

projecting a patterned beam of radiation onto a target portion of said substrate using a projection system;

holding said projection system using a frame;

supporting said projection system on said frame using a mount, said mount comprising a piezo-electric sensor to detect the force applied to said projection system; and

controlling a position of said support and/or said substrate table based on said detected force.

15. A lithographic apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate

a frame constructed to hold said projection system;

a mount constructed to support said projection system on said frame, said mount comprising a piezo-electric sensor constructed to detect the force applied to said projection system; and

a second mount constructed to support said frame and minimize vibration of said frame,

wherein the vibration of said frame is minimized by controlling said second mount based on said detected force.

16. A lithographic apparatus according to claim 15, further comprising a plurality of second mounts, each constructed to support said frame and minimize vibration of said frame, wherein the vibration of said frame is minimized by controlling each second mount based on said detected force.

17. A lithographic apparatus according to claim 15, wherein said second mount is an airmount.

18. A lithographic apparatus according to claim 15, wherein said mount further comprises a piezo-electric actuator constructed to apply a force to said projection system.

19. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of said substrate using a projection system;

holding said projection system using a frame;

supporting said projection system on said frame using a mount, said mount comprising a piezo-electric sensor to detect the force applied to said projection system;

supporting said frame and minimizing a vibration of said frame using a second mount; and

controlling said second mount to minimize the vibration of said frame based on said detected force.