Pattern forming apparatus and pattern forming method, movable member drive system and movable member drive method, exposure apparatus and exposure method, and device manufacturing method

• US 20070263191A1
• Filed: 02/21/2007
• Published: 11/15/2007
• Est. Priority Date: 02/21/2006
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Granted Patent: US 8,908,145 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70641 Focus
• CPC Class Codes: G03F 7/70666 Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
• CPC Class Codes: G03F 7/70675 Latent image, i.e. measuring the image of the exposed resist prior to development
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus
• CPC Class Codes: G03F 9/7026 Focusing
• CPC Class Codes: G03F 9/7084 Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
• CPC Class Codes: Y10T 29/49826 Assembling or joining

Abstract

A partial section of an aerial image measuring unit is arranged at a wafer stage and part of the remaining section is arranged at a measurement stage, and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system. Therefore, for example, when the aerial image measuring unit measures a best focus position of the projection optical system, the measurement can be performed using the position of the wafer stage, at which a partial section of the aerial image measuring unit is arranged, in a direction parallel to an optical axis of the projection optical system as a datum for the best focus position. Accordingly, when exposing an object with illumination light, the position of the wafer stage in the direction parallel to the optical axis is adjusted with high accuracy based on the measurement result of the best focus position.

Claims

1. A pattern forming apparatus that forms a pattern on an object with an energy beam via an optical system, the apparatus comprising:

a first movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a second movable body that moves independently from the first movable body within the predetermined plane; and

an aerial image measuring unit a partial section of which is arranged at the first movable body and part of the remaining section of which is arranged at the second movable body, and which measures an aerial image of a mark formed via the optical system.

2. The pattern forming apparatus of claim 1, wherein

the aerial image measuring unit performs the measurement in at least one of a first state where the first movable body and the second movable body are closer together and a second state where the first movable body and the second movable body are in contact with each other.

3. The pattern forming apparatus of claim 1, wherein

the aerial image measuring unit has a measurement pattern and an optical member that are arranged at the first movable body and a photodetection system that is arranged at the second movable body, and measures the aerial image with the photodetection system via the measurement pattern and the optical system.

4. The pattern forming apparatus of claim 3, wherein

at the first movable body, the measurement pattern and the optical system are each arranged in pairs, and

at the second movable body, a pair of photodetection systems that correspond to a pair of the measurement patterns and a pair of the optical systems are arranged.

5. The pattern forming apparatus of claim 4, wherein

at the first movable body, a fiducial mark is arranged in a predetermined positional relation with a pair of the measurement patterns.

6. The pattern forming apparatus of claim 5, wherein

a pair of the measurement patterns are placed apart in a direction parallel to the second axis on a surface of the first movable body, and the fiducial mark is placed between a pair of the measurement patterns and on a center axis parallel to the first axis on the surface of the first movable body.

7. The pattern forming apparatus of claim 1, further comprising:

a position measuring system that measures position information of the first movable body within the plane.

8. The pattern forming apparatus of claim 7, wherein

the position measuring system includes

a first grating that has a grating whose periodic direction is a direction parallel to the first axis, and is placed on the first movable body,

a second grating that has a grating whose periodic direction is a direction parallel to the second axis, and is placed on the first movable body,

a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis, and measures position information of the first movable body in a direction parallel to the first axis by the first head that faces the first grating, and

a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis, and measures position information of the first movable body in a direction parallel to the second axis by the second head that faces the second grating.

9. The pattern forming apparatus of claim 8, wherein

at least one of the first grating and the second grating is placed in pairs spaced apart at a predetermined distance in a direction intersecting the periodic direction of the grating on the first movable body.

10. The pattern forming apparatus of claim 8, wherein

the plurality of first heads are symmetrically placed with respect to the optical system as a center, and the plurality of seconded heads are symmetrically placed with respect to the optical system as a center.

11. The pattern forming apparatus of claim 8, further comprising:

a controller that performs transfer of a measurement value between the plurality of second heads according to movement of the first movable body in a direction parallel to the first axis, and performs transfer of a measurement value between the plurality of first heads according to movement of the first movable body in a direction parallel to the second axis.

12. The pattern forming apparatus of claim 8, wherein

the plurality of first heads are placed on an axis that passes through a center of the optical system and is parallel to the second axis, and

the plurality of second heads are placed on an axis that passes through the center of the optical system and is parallel to the first axis.

13. The pattern forming apparatus of claim 12, wherein

at least one of the first head that is located innermost out of the plurality of first heads and the second head that is located innermost out of the plurality of second heads is fixed to the optical system.

14. The pattern forming apparatus of claim 8, wherein

all of the first grating and the second grating are directly formed on an upper surface of the first movable body.

15. The pattern forming apparatus of claim 8, wherein

the second movable body comprises a reference member on which a pair of reference gratings that are irradiated with a detection light from two first heads out of the plurality first heads are formed, and

the reference member is kinematically supported on the second movable body.

120. The pattern forming apparatus of claim 8, wherein

the plurality of first heads are placed at a distance that is narrower than a width of the first grating in a direction parallel to the second axis, and

the plurality of second heads are placed at a distance that is narrower than a width of the second grating in a direction parallel to the first axis.

121. The pattern forming apparatus of claim 1, further comprising:

a liquid immersion unit that, when at least one of the first movable body and the second movable body faces the optical system, forms a liquid immersion area by supplying liquid to a space between the optical system and the at least one of the movable bodies that faces the optical system.

122. The pattern forming apparatus of claim 121, wherein

the first axis and the second axis are orthogonal to each other, and

the liquid immersion unit has a liquid supply pipe and a liquid recovery pipe that are placed symmetrically with respect to an axis parallel to the first axis and severally extend in directions that intersect the axis at an angle of 45 degrees.

123. The pattern forming apparatus of claim 121, wherein

on an upper surface of the first movable body, a first liquid repellent area in the vicinity of a mounting area of the object and a second liquid repellent area that is placed around the first liquid repellent area and whose resistance to the energy beam is inferior to that of the first liquid repellent area are formed.

124. The pattern forming apparatus of claim 123, further comprising:

a liquid repellent plate that is arranged around the mounting area of the object on the upper surface of the first movable body, wherein

the first liquid repellent area and the second liquid repellent area are formed on an upper surface of the liquid repellent plate.

125. The pattern forming apparatus of claim 124, wherein

all of the first grating and the second grating are formed on the upper surface of the liquid repellent plate.

126. The pattern forming apparatus of claim 1, further comprising:

a stopper mechanism that has a buffer unit and a shutter, and blocks the two movable bodies from coming closer to each other than a predetermined distance when the shutter is closed, the buffer unit being arranged at one of the first movable body and the second movable body and buffering impact from a uniaxial direction, and the shutter being able to come into contact with the buffer unit, being formed at the other of the movable bodies and opening/closing an opening in which at least part of a tip portion of the buffer unit can enter; and

a drive unit that drives the shutter, wherein

during movement of at least one of the first movable body and the second movable body in a direction in which the movable bodies come close together, the drive unit starts an operation of opening the shutter.

127. The pattern forming apparatus of claim 126, wherein

when different areas on the object are sequentially exposed, the drive unit starts the operation of opening the shutter before a last area is exposed.

128. The pattern forming apparatus of claim 1, wherein

at the second movable body, plural types of sensors are placed on a straight line that passes through a center of the second movable body in a direction in which the first movable body and the second movable body come close together or separate from each other.

16-119. -119. (canceled)

129. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a first movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a second movable body that moves independently from the first movable body within the plane;

a first measuring system that measures position information of the second movable body; and

a second measuring system that measures position information of the first movable body and whose measurement value has short-term stability superior to that of the first measuring system.

130. The pattern forming apparatus of claim 129, wherein

on the first movable body, a first grating that has a grating whose periodic direction is a direction parallel to the first axis, and a second grating that has a grating whose periodic direction is a direction parallel to the second axis are arranged, and

the second measuring system includes an encoder system that has a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the first movable body in a direction parallel to the first axis by the first head that faces the first grating, and a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the first movable body in a direction parallel to the second axis by the second head that faces the second grating.

131. The pattern forming apparatus of claim 130, wherein

on the first movable body, the first grating is arranged in pairs spaced apart at a predetermined distance in a direction parallel to the second axis and the second grating is arranged in pairs spaced apart at a predetermined distance in a direction parallel to the first axis, and

the encoder system measures position information of the first movable body in a direction parallel to the first axis and a direction parallel to the second axis and rotation information within the plane, based on measurement values of at least three heads out of two of the plurality of first heads that face a pair of the first gratings respectively and two of the plurality of second heads that face a pair of the second gratings respectively.

132. The pattern forming apparatus of claim 131, further comprising:

an optical system that irradiates an energy beam on the object, wherein

the plurality of first heads are placed on an axis that passes through a center of the optical system and is parallel to the second axis, and

the plurality of second heads are placed on an axis that passes through the center of the optical system and is parallel to the first axis.

133. The pattern forming apparatus of claim 132, wherein

the first head that is located innermost out of the plurality of first heads is fixed to the optical system, and the second head that is located innermost out of the plurality of second heads is fixed to the optical system.

134. The pattern forming apparatus of claim 132, wherein

the second measuring system includes an interferometer system that measures position information of the first movable body within the plane.

135. The pattern forming apparatus of claim 134, further comprising:

a measurement controller that measures position information of the first movable body using the encoder system at the time of an operation of forming the pattern on the object, and measures position information of the first movable body using the interferometer system at the time of an operation of replacing the object mounted on the first movable body.

136. The pattern forming apparatus of claim 135, wherein

at the time of the replacement operation, position information of the first movable body in a direction parallel to one axis of the first axis and the second axis is measured using the interferometer system and position information of the first movable body in a direction parallel to the other axis is measured using the encoder system.

137. The pattern forming apparatus of claim 130, wherein

the plurality of first heads are placed at a distance that is narrower than a width of the first grating in a direction parallel to the second axis, and

the plurality of second heads are placed at a distance that is narrower than a width of the second grating in a direction parallel to the first axis.

138. The pattern forming apparatus of claim 129, wherein

the second measuring system includes an interferometer system that measures position information of the first movable body within the plane.

139. A pattern forming apparatus that forms a pattern on an object by irradiating an energy beam, the apparatus comprising:

a first movable body which moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object, and on which a first grating that has a grating whose periodic direction is a direction parallel to the first axis and a second grating that has a grating whose periodic direction is a direction parallel to the second axis are arranged;

a second movable body that moves independently from the first movable body within the plane;

a first measuring system that includes an interferometer that measures position information of the second movable body within the plane; and

a second measuring system that includes an encoder system that has a plurality of heads to which the first and second gratings are severally placed facing, and measures position information of the first movable body within the plane.

140. The pattern forming apparatus of claim 139, wherein

the second measuring system includes an interferometer system that measures position information of the first movable body within the plane.

141. The pattern forming apparatus of claim 140, further comprising:

an optical system that irradiates the energy beam on the object, wherein

position information of the first movable body is measured using the encoder system at the time of an operation of forming the pattern on the object via the optical system, and position information of the first movable body is measured using the interferometer system at the time of a replacement operation of the object mounted on the first movable body.

142. The pattern forming apparatus of claim 141, wherein

at the time of the replacement operation, position information of the first movable body in a direction parallel to one axis of the first axis and the second axis is measured using the interferometer system and position information of the first movable body in a direction parallel to the other axis is measured using the encoder system.

143. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a movable body on which the object is mounted, and which moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a first grating that has a grating whose periodic direction is a direction parallel to the first axis, and is placed on the movable body;

a second grating that has a grating whose periodic direction is a direction parallel to the second axis, and is placed on the movable body;

a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis, and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating; and

a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis, and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating, wherein

the plurality of first heads are placed at a distance that is narrower than a width of the first grating in a direction parallel to the second axis, and

the plurality of second heads are placed at a distance that is narrower than a width of the second grating in a direction parallel to the first axis.

144. An exposure apparatus that exposes an object with an energy beam via an optical system, the apparatus comprising:

first and second movable bodies that are independently movable within a predetermined plane; and

a detecting unit that has first and second members respectively arranged at the first and second movable bodies, and detects the energy beam via the first and second members.

145. The exposure apparatus of claim 144, wherein

at the time of the detection, the first movable body is placed facing the optical system, and the energy beam from the optical system is led to the second member of the second movable body via the first member of the first movable body.

146. The exposure apparatus of claim 144, wherein

the first movable body out of the first and second movable bodies can hold the object.

147. The exposure apparatus of claim 146, wherein

the second movable body has a measurement member that is separate from the second member and is used for an operation different from the exposure.

148. The exposure apparatus of claim 147, wherein

at least part of the measurement member is arranged at a surface of the second movable body that is substantially parallel to the plane.

149. The exposure apparatus of claim 144, wherein

part of the first member is arranged at a surface of the first movable body that is substantially parallel to the plane.

150. The exposure apparatus of claim 144, wherein

the detecting unit measures a pattern image that is formed via the optical system.

151. The exposure apparatus of claim 150, wherein

the first member includes an aperture pattern that is placed facing the optical system, and the detecting unit measures the pattern image via the aperture pattern.

152. The exposure apparatus of claim 144, further comprising:

a measuring system that includes a first measuring unit that measures position information of the first movable body and a second measuring unit that measures position information of the second movable body, wherein

a measurement value of the first measuring unit has short-term stability superior to that of the second measuring unit.

153. The exposure apparatus of claim 144, wherein

the first movable body moves in first and second directions holding the object within the plane, and also on which a first grating section that has a grating periodically arrayed in the first direction is arranged, and

the first measuring unit includes an encoder system that measures position information of the first movable body in the first direction by a first head unit that has a detection range wider than a width of the first grating section in the second direction.

154. The exposure apparatus of claim 153, wherein

the first grating section is arranged in pairs with the object in between in the second direction, and

the first head unit has the detection range on each of both sides of an irradiation position of the energy beam in the second direction.

155. The exposure apparatus of claim 154, wherein

the first head unit has the detection ranges that are spaced apart in the second direction at a distance that is substantially the same as, or wider than a width of the first grating section.

156. The exposure apparatus of claim 153, wherein

the first head unit has a plurality of first heads whose positions are different in the second direction, and the encoder system measures position information of the first movable body in the first direction by the first head that faces the first grating section within the detection range.

157. The exposure apparatus of claim 156, wherein

the plurality of first heads are placed at a distance that is narrower than a width of the first grating section in the second direction.

158. The exposure apparatus of claim 153, wherein

on the first movable body, a second grating section that has a grating periodically arrayed in the second direction is arranged, and

the encoder system measures position information of the first movable body in the second direction by a second head unit that has a detection range wider than a width of the second grating section in the first direction.

159. The exposure apparatus of claim 158, wherein

the second grating section is arranged in pairs with the object in between in the first direction, and

the second head unit has the detection range on each of both sides of an irradiation position of the energy beam in the first direction.

160. The exposure apparatus of claim 158, wherein

the second head unit has a plurality of second heads whose positions are different in the first direction, and the encoder system measures position information of the first movable body in the second direction by the second head that faces the second grating section within the detection range.

161. The exposure apparatus of claim 153, wherein

position information measured by the encoder system is used in at least an exposure operation of the object.

162. The exposure apparatus of claim 153, wherein

position information measured by the encoder system is used in at least a detection operation of marks on the object.

163. The exposure apparatus of claim 153, wherein

the second measuring unit includes an interferometer that measures position information of the second movable body.

164. The exposure apparatus of claim 153, wherein

the first measuring unit includes an interferometer system that measures position information of the first movable body, and a measurement direction of position information of the first movable body by the interferometer system includes a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

165. The exposure apparatus of claim 164, wherein

the interferometer system measures position information of the first movable body in a direction different from directions within the plane.

166. The exposure apparatus of claim 164, wherein

the interferometer system measures position information of the first movable body in at least one measurement direction of position information of the first movable body by the encoder system.

167. The exposure apparatus of claim 164, wherein

the second measuring unit includes an interferometer system that measures position information of the second movable body, and

the exposure apparatus further comprises

a controller that controls movement of the second movable body based on measurement information of the second measuring unit that includes position information measured by the interferometer system.

168. The exposure apparatus of claim 167, wherein

the measurement information includes position information of the second movable body by the interferometer system in a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

169. The exposure apparatus of claim 144, wherein

the first movable body moves in first and second directions holding the object within the plane, and on which a pair of first grating sections that each have a grating periodically arrayed in the first direction are arranged with the object in between in the second direction and a pair of second grating sections that each have a grating periodically arrayed in the second direction are arranged with the object in between in the first direction, and

the exposure apparatus further comprises

a measuring system that includes an encoder system that measures position information of the first movable body in the first direction by a plurality of first heads whose positions are different in the second direction and different two heads of which face the pair of first grating sections, and also measures position information of the first movable body in the second direction by a plurality of second heads whose positions are different in the first direction and different two heads of which face the pair of second grating sections.

170. The exposure apparatus of claim 169, wherein

the plurality of first heads are placed at a distance that is narrower than a width of the first grating section in the second direction, and the plurality of second heads are placed at a distance that is narrower than a width of the second grating section in the first direction.

171. The exposure apparatus of claim 169, wherein

the second measuring unit includes an interferometer that measures position information of the second movable body.

172. The exposure apparatus of claim 169, wherein

the first measuring unit includes an interferometer system that measures position information of the first movable body, and a measurement direction of position information of the first movable body by the interferometer system includes a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

173. The exposure apparatus of claim 172, wherein

the interferometer system measures position information of the first movable body in a direction different from directions within the plane.

174. The exposure apparatus of claim 172, wherein

the interferometer system measures position information of the first movable body in at least one measurement direction of position information of the first movable body by the encoder system.

175. The exposure apparatus of claim 172, wherein

the second measuring unit includes an interferometer system that measures position information of the second movable body, and

the exposure apparatus further comprises

a controller that controls movement of the second movable body based on measurement information of the second measuring unit that includes position information measured by the interferometer system.

176. The exposure apparatus of claim 175, wherein

the measurement information includes position information of the second movable body by the interferometer system in a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

177. The exposure apparatus of claim 144, further comprising:

an optical member to which the object is placed facing, and which emits the energy beam; and

a liquid immersion system that forms a liquid immersion area by filling a space between the optical member and the object with liquid, wherein

the liquid immersion area is maintained in a space between the optical member and the second movable body that is placed facing the optical member by replacing the first movable body.

178. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 144;

and

developing the exposed object.

179. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a first movable body that is movable within a predetermined plane, holding the object;

a second movable body that is movable independently from the first movable body within the plane; and

a measuring system that includes a first measuring unit that measures position information of the first movable body and a second measuring unit that measures position information of the second movable body, a measurement value of the first measuring unit having short-term stability superior to that of the second measuring unit.

180. The exposure apparatus of claim 179, wherein

the first movable body moves in first and second directions holding the object within the plane, and also on which a first grating section that has a grating periodically arrayed in the first direction is arranged, and

the first measuring unit includes an encoder system that measures position information of the first movable body in the first direction by a first head unit that has a detection range wider than a width of the first grating section in the second direction.

181. The exposure apparatus of claim 180, wherein

the first grating section is arranged in pairs with the object in between in the second direction, and

the first head unit has the detection range on each of both sides of an irradiation position of the energy beam in the second direction.

182. The exposure apparatus of claim 181, wherein

the first head unit has the detection ranges that are spaced apart in the second direction at a distance that is substantially the same as, or wider than a width of the first grating section.

183. The exposure apparatus of claim 180, wherein

the first head unit has a plurality of first heads whose positions are different in the second direction, and the encoder system measures position information of the first movable body in the first direction by the first head that faces the first grating section within the detection range.

184. The exposure apparatus of claim 183, wherein

the plurality of first heads are placed at a distance that is narrower than a width of the first grating section in the second direction.

185. The exposure apparatus of claim 180, wherein

on the first movable body, a second grating section that has a grating periodically arrayed in the second direction is arranged, and

the encoder system measures position information of the first movable body in the second direction by a second head unit that has a detection range wider than a width of the second grating section in the first direction.

186. The exposure apparatus of claim 185, wherein

the second grating section is arranged in pairs with the object in between in the first direction, and

the second head unit has the detection range on each of both sides of an irradiation position of the energy beam in the first direction.

187. The exposure apparatus of claim 185, wherein

the second head unit has a plurality of second heads whose positions are different in the first direction, and the encoder system measures position information of the first movable body in the second direction by the second head that faces the second grating section within the detection range.

188. The exposure apparatus of claim 180, wherein

position information measured by the encoder system is used in at least an exposure operation of the object.

189. The exposure apparatus of claim 180, wherein

position information measured by the encoder system is used in at least a detection operation of marks on the object.

190. The exposure apparatus of claim 180, wherein

the second measuring unit includes an interferometer that measures position information of the second movable body.

191. The exposure apparatus of claim 180, wherein

the first measuring unit includes an interferometer system that measures position information of the first movable body, and a measurement direction of position information of the first movable body by the interferometer system includes a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

192. The exposure apparatus of claim 191, wherein

the interferometer system measures position information of the first movable body in a direction different from directions within the plane.

193. The exposure apparatus of claim 191, wherein

the interferometer system measures position information of the first movable body in at least one measurement direction of position information of the first movable body by the encoder system.

194. The exposure apparatus of claim 191, wherein

the second measuring unit includes an interferometer system that measures position information of the second movable body, and

the exposure apparatus further comprises

a controller that controls movement of the second movable body based on measurement information of the second measuring unit that includes position information measured by the interferometer system.

195. The exposure apparatus of claim 194, wherein

the measurement information includes position information of the second movable body by the interferometer system in a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

196. The exposure apparatus of claim 179, further comprising:

an optical member to which the object is placed facing, and which emits the energy beam; and

a liquid immersion system that forms a liquid immersion area by filling a space between the optical member and the object with liquid, wherein

the liquid immersion area is maintained in a space between the optical member and the second movable body that is placed facing the optical member by replacing the first movable body.

197. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 179;

and

developing the exposed object.

198. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a first movable body which is movable in first and second directions within a predetermined plane, holding the object, and on which a first grating section that has a grating periodically arrayed in the first direction and a second grating section that has a grating periodically arrayed in the second direction are arranged;

a second movable body that is movable independently from the first movable body within the plane; and

a measuring system that has a first measuring unit that includes an encoder system that measures position information of the first movable body by a plurality of heads different two of which face the first and second grating sections, and a second measuring unit that includes an interferometer that measures position information of the second movable body.

199. The exposure apparatus of claim 198, further comprising:

a correction unit that corrects a measurement error of the encoder system that occurs due to at least one of the first and second grating sections.

200. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 198;

and

developing the exposed object.

201. A pattern forming method of forming a pattern on an object, the method comprising:

a first process of mounting the object on a first movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis;

a second process of measuring position information of a second movable body that moves independently from the first movable body within the plane, using a first measuring system; and

a third process of measuring position information of the first movable body using a second measuring system whose measurement value has short-term stability superior to that of the first measuring system.

202. The pattern forming method of claim 201 wherein

on the first movable body, a first grating that has a grating whose periodic direction is a direction parallel to the first axis and a second grating that has a grating whose periodic direction is a direction parallel to the second axis are arranged, and

in the third process, an encoder system is used as the second measuring system, the encoder system having a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the first movable body in a direction parallel to the first axis by the first head that faces the first grating, and a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the first movable body in a direction parallel to the second axis by the second head that faces the second grating.

203. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 201;

and

a process of performing processing to the object on which the pattern has been formed.

204. A pattern forming method of forming a pattern on an object by irradiating an energy beam, the method comprising:

a process of mounting the object on a first movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis;

a first measurement process of measuring position information within the plane of a second movable body that moves independently from the first movable body within the plane, using a first measuring system that includes an interferometer; and

a second measurement process of measuring position information of the first movable body within the plane using a second measuring system that includes an encoder system that has a plurality of heads, to which first and second gratings that are placed on the first movable body and have gratings whose periodic directions are directions parallel to the first and second axes respectively are severally placed facing, and measures position information of the first movable body within the plane.

205. The pattern forming method of claim 204, wherein

in the second measurement process, position information of the first movable body is measured using the second measuring system at the time of an operation of forming a pattern on the object mounted on the first movable body by irradiating the energy beam, and

the exposure method further comprises

a third measurement process of measuring position information of the first movable body using a third measuring system that is composed of an interferometer, at the time of a replacement operation of the object mounted on the first movable body.

206. The pattern forming method of claim 205, wherein

in the third measurement process, at the time of the replacement operation, position information of the first movable body in a direction parallel to one axis of the first axis and the second axis is measured with the third measuring system and position information in a direction parallel to the other axis is measured using the second measuring system.

207. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 204;

and

a process of performing processing to the object on which the pattern has been formed.

208. A movable body drive system that drives a movable body that moves within a predetermined plane that includes a first axis and a second axis orthogonal to each other, the system comprising:

a first interferometer that measures position information of the movable body in a direction parallel to the first axis by irradiating a measurement beam to a reflection surface arranged on the movable body;

a second interferometer that measures position information of the movable body in a direction parallel to the second axis by irradiating a measurement beam to a reflection surface arranged on the movable body;

a first grating that has a grating whose periodic direction is a direction parallel to the first axis, and is placed on the movable body;

a first head unit that has a plurality of heads whose positions are different in a direction parallel to the second axis and constitutes a first encoder that measures position information of the movable body in a direction parallel to the first axis by the head that faces the first grating;

a second grating that has a grating whose periodic direction is a direction parallel to the second axis, and is placed on the movable body;

a second head unit that has a plurality of heads whose positions are different in a direction parallel to the first axis and constitutes a second encoder that measures position information of the movable body in a direction parallel to the second axis by the head that faces the second grating;

an arithmetic processing unit that, while moving the movable body in a direction parallel to the first axis based on measurement values of the first and second interferometers, or measurement values of the second interferometer and the first head unit, obtains correction information on grating warp of the second grating by performing a predetermined statistical computation using measurement values obtained from the plurality of heads of the second head unit that are sequentially placed facing the second grating according to the movement and a measurement value of at least one of the first interferometer and the first head unit that corresponds to each of the measurement values; and

a controller that performs drive of the movable body in a direction parallel to the second axis, while correcting the measurement values obtained from the second head unit based on the measurement value of at least one of the first interferometer and the first head unit and the correction information on grating warp of the second grating.

209. The movable body drive system of claim 208, wherein

the arithmetic processing unit computes an average value of the measurement values of the plurality of heads of the second head unit that are sequentially placed facing the second grating, as the correction information on grating warp.

210. The movable body drive system of claim 208, wherein

the reflection surface of the movable body to which the measurement beam from the second interferometer is irradiated is an ideal plane, and

the arithmetic processing unit moves the movable body in a direction parallel to the first axis based on a measurement value of at least one of the first interferometer and the first head unit while fixing a measurement value of the second interferometer to a predetermined value.

211. The movable body drive system of claim 208, wherein

the arithmetic processing unit further moves the movable body in a direction parallel to the second axis based on measurement values of the first and second interferometers, and while moving the movable body, obtains correction information on grating pitch of the second grating that is sequentially placed facing the second head unit according to the movement based on a measurement value of the second interferometer and a measurement value of the second head unit, and

the controller performs drive of the movable body in a direction parallel to the second axis, while correcting the measurement values obtained from the second head unit based on a measurement value of at least one of the first interferometer and the first head unit, the correction information on grating warp of the second grating and the correction information on grating pitch of the second grating.

212. The movable body drive system of claim 211, wherein

the reflection surface of the movable body to which the measurement beam from the first interferometer is irradiated is an ideal plane, and

the arithmetic processing unit moves the movable body in a direction parallel to the second axis based on a measurement value of the second interferometer while fixing a measurement value of the first interferometer to a predetermined value.

213. The movable body drive system of claim 211, wherein

the arithmetic processing unit moves the movable body in a direction parallel to the second axis at a low speed at a level in which short-term fluctuation of the measurement value of the second interferometer can be ignored.

214. A pattern forming apparatus, comprising:

a movable body on which an object is mounted, and which can move within a moving plane, holding the object; and

the movable body drive system of claim 208 that drives the movable body for formation of a pattern to the object.

215. The pattern forming apparatus of claim 214, wherein

the formation of a pattern is performed by exposing the object by irradiating an energy beam.

216. A movable body drive method of moving a movable body that moves within a predetermined plane that includes a first axis and a second axis orthogonal to each other, the method comprising:

a first movement process of moving the movable body in a direction parallel to the first axis, based on a measurement value of a first interferometer that measures position information of the movable body in a direction parallel to the first axis by irradiating a measurement beam to a reflection surface arranged on the movable body, and based on a measurement value of a second interferometer that measures position information of the movable body in a direction parallel to the second axis by irradiating a measurement beam to a reflection surface arranged on the movable body;

a first decision process of deciding correction information on grating warp of a first grating that has a grating whose periodic direction is a direction parallel to the second axis and is placed on the movable body, by performing a predetermined statistical computation using measurement values obtained from a plurality of heads that are sequentially placed facing the first grating according to movement of the movable body in the first movement process, and a measurement value of the first interferometer that corresponds to each of the measurement values, the plurality of heads being among a plurality of heads whose positions are different in a direction parallel to the first axis and which are included in a first head unit that constitutes an encoder that measures position information of the movable body in a direction parallel to the second axis by irradiating a detection light to the first grating; and

a drive process of performing drive of the movable body in a direction parallel to the second axis, while correcting the measurement values obtained from the first head unit based on a measurement value of the first interferometer and the correction information on grating warp of the first grating.

217. The movable body drive method of claim 216, wherein

in the first decision process, an average value of the measurement values of the plurality of heads of the first head unit that are sequentially placed facing the first grating is computed, as the correction information on grating warp.

218. The movable body drive method of claim 216, wherein

the reflection surface of the movable body to which the measurement beam from the second interferometer is irradiated is an ideal plane, and

in the first movement process, the movable body is moved in a direction parallel to the first axis based on a measurement value of the first interferometer while fixing a measurement value of the second interferometer to a predetermined value.

219. The movable body drive method of claim 216, further comprising:

a second movement process of moving the movable body in a direction parallel to the second axis based on measurement values of the first and second interferometers; and

a second decision process of obtaining correction information on grating pitch of the first grating that is sequentially placed facing the first head unit according to movement of the movable body in the second movement process, based on a measurement value of the second interferometer and measurement values of the first head unit, wherein

in the drive process, drive of the movable body in a direction parallel to the second axis is performed, while correcting the measurement values obtained from the first head unit based on a measurement value of the second interferometer, the correction information on grating warp of the first grating and the correction information on grating pitch of the first grating.

220. The movable body drive method of claim 219, wherein

the reflection surface of the movable body to which the measurement beam from the first interferometer is irradiated is an ideal plane, and

in the second movement process, the movable body is moved in a direction parallel to the second axis based on a measurement value of the second interferometer while fixing a measurement value of the first interferometer to a predetermined value.

221. The movable body drive method of claim 219, wherein

in the second movement process, the movable body is moved in a direction parallel to the second axis at a low speed at a level in which short-term fluctuation of the measurement value of the second interferometer can be ignored.

222. A pattern forming method, comprising:

a process of mounting an object on a movable body that can move within a moving plane; and

a process of driving the movable body using the movable body drive method of claim 216 for formation of a pattern to the object.

223. The pattern forming method of claim 222, wherein

the formation of a pattern is performed by exposing the object by irradiating an energy beam.

224. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 222;

and

a process of performing processing to the object on which the pattern has been formed.

225. An exposure method of exposing an object with an energy beam via an optical system, the method comprising:

detecting the energy beam via first and second members by using a detecting unit that has the first and second members respectively arranged at first and second movable bodies that are independently movable within a predetermined plane.

226. The exposure method of claim 225, wherein

at the time of the detection, the first movable body is placed facing the optical system, and the energy beam from the optical system is led to the second member of the second movable body via the first member of the first movable body.

227. The exposure method of claim 225, wherein

the first movable body out of the first and second movable bodies can hold the object.

228. The exposure method of claim 227, wherein

the second movable body has a measurement member that is separate from the second member and is used for an operation different from the exposure.

229. The exposure method of claim 228, wherein

at least part of the measurement member is arranged on a surface of the second movable body that is substantially parallel to the plane.

230. The exposure method of claim 225, wherein

part of the first member is arranged on a surface of the first movable body that is substantially parallel to the plane.

231. The exposure method of claim 225, wherein

a pattern image that is formed via the optical system is measured using the detecting unit.

232. The exposure method of claim 231, wherein

the first member includes an aperture pattern that is placed facing the optical system, and the pattern image is measured via the aperture pattern.

233. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 225;

and

developing the exposed object.

234. An exposure method of exposing an object with an energy beam, the method comprising:

a process of measuring position information of a first movable body that is movable within a predetermined plane holding the object and of a second movable body that is movable independently from the first movable body within the plane, using first and second measuring units, wherein

a measurement value of the first measuring unit has short-term stability superior to that of the second measuring unit.

235. The exposure method of claim 234, wherein

the first movable body moves in first and second directions holding the object within the plane, and also on which a first grating section that has a grating periodically arrayed in the first direction is arranged, and

the first measuring unit includes an encoder system that measures position information of the first movable body in the first direction by a first head unit that has a detection range wider than a width of the first grating section in the second direction.

236. The exposure method of claim 235, wherein

the first grating section is arranged in pairs with the object in between in the second direction, and

the first head unit has the detection range on each of both sides of an irradiation position of the energy beam in the second direction.

237. The exposure method of claim 236, wherein

the first head unit has the detection ranges that are spaced apart at a distance that is substantially the same as, or wider than a width of the first grating section.

238. The exposure method of claim 235, wherein

the first head unit has a plurality of first heads whose positions are different in the second direction, and the encoder system measures position information of the first movable body in the first direction by the first head that faces the first grating section within the detection range.

239. The exposure method of claim 238, wherein

the plurality of first heads are placed at a distance narrower than a width of the first grating section in the second direction.

240. The exposure method of claim 235, wherein

on the first movable body, a second grating section that has a grating periodically arrayed in the second direction is arranged, and

the encoder system measures position information of the first movable body in the second direction by a second head unit that has a detection range wider than a width of the second grating section in the first direction.

241. The exposure method of claim 240, wherein

the second grating section is arranged in pairs with the object in between in the first direction, and

the second head unit has the detection range on each of both sides of an irradiation position of the energy beam in the first direction.

242. The exposure method of claim 240, wherein

the second head unit has a plurality of second heads whose positions are different in the first direction, and the encoder system measures position information of the first movable body in the second direction by the second head that faces the second grating section within the detection range.

243. The exposure method of claim 235, wherein

position information measured by the encoder system is used in at least an exposure operation of the object.

244. The exposure method of claim 235, wherein

position information measured by the encoder system is used in at least a detection operation of marks on the object.

245. The exposure method of claim 235, wherein

the second measuring unit includes an interferometer that measures position information of the second movable body.

246. The exposure method of claim 235, wherein

the first measuring unit includes an interferometer system that measures position information of the first movable body, and a measurement direction of position information of the first movable body by the interferometer system includes a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

247. The exposure method of claim 246, wherein

the interferometer system measures position information of the first movable body in a direction different from directions within the plane.

248. The exposure method of claim 246, wherein

the interferometer system measures position information of the first movable body in at least one measurement direction of position information of the first movable body by the encoder system.

249. The exposure method of claim 246, wherein

the second measuring unit includes an interferometer system that measures position information of the second movable body, and

movement of the second movable body is controlled based on measurement information of the first measuring unit that includes position information measured by the interferometer system.

250. The exposure method of claim 249, wherein

the measurement information includes position information of the second movable body by the interferometer system in a direction that is different from a measurement direction of position information of the first movable body by the encoder system.

251. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 234;

and

developing the exposed object.

252. An exposure method of exposing an object with an energy beam, the method comprising:

a process of measuring position information of a first movable body, which is movable in first and second directions within a predetermined plane holding the object and on which a first grating section that has a grating periodically arrayed in the first direction and a second grating section that has a grating periodically arrayed in the second direction are arranged, by a plurality of heads of an encoder system comprised in a first measuring unit, different two heads of which faces the first and second grating sections; and

a process of measuring position information of a second movable body that is movable independently from the first movable body within the plane by an interferometer comprised in a second measuring unit.

253. The exposure method of claim 252, further comprising:

a process of correcting a measurement error of the encoder system that occurs due to at least one of the first and second grating sections.

254. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 252;

and

developing the exposed object.