Exposure apparatus, exposure method, and method for producing device

• US 20070263195A1
• Filed: 07/20/2007
• Published: 11/15/2007
• Est. Priority Date: 06/10/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation, Nikon Engineering Co. Ltd. (Nikon Corporation)
• Original Assignee: Nikon Corporation, Nikon Engineering Co. Ltd. (Nikon Corporation)
• Inventors: Nagasaka, Hiroyuki, Okuyama, Takeshi
• Granted Patent: US 8,508,713 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.

Claims

1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate, the apparatus comprising a liquid diverter in the space to promote liquid flow across the space.

2. The apparatus of claim 1, wherein the liquid diverter is configured to divert the liquid in a direction substantially parallel to the plane of the substrate.

3. The apparatus of claim 1, wherein the liquid diverter extends in a direction perpendicular to the plane of the substrate.

4. The apparatus of claim 1, wherein the projected pattern is configured to be projected through an image field and a liquid diverter is positioned on each side of the image field.

5. The apparatus of claim 1, wherein the liquid diverter is an obstructing body with a substantial volume compared to the volume of the space.

6. The apparatus of claim 5, wherein the liquid diverter is configured to promote the liquid flow across the space from one side to an opposite side.

7. The apparatus of claim 5, wherein the liquid diverter is curved to promote the liquid to flow in a curved path.

8. The apparatus of claim 1, wherein the liquid diverter is attached to a final element of a projection system which is configured to project the patterned beam onto the substrate.

9. The apparatus of claim 1, wherein the liquid diverter is a vane with an elongate vertical cross-section.

10. The apparatus of claim 1, wherein the liquid diverter has an elongate horizontal cross-section.

11. The apparatus of claim 1, further comprising a liquid confinement structure configured to at least partly confine the liquid to the space and wherein the liquid diverter is attached to the liquid confinement structure.

12. The apparatus of claim 1, wherein the liquid diverter is hollow.

13. The apparatus of claim 1, wherein the liquid diverter is solid.

14. The apparatus of claim 1, wherein the liquid diverter is porous.

15. The apparatus of claim 1, wherein the liquid diverter has a surface finish to promote laminar flow of the liquid.

16. The apparatus of claim 1, comprising a plurality of liquid diverters.

17. The apparatus of claim 1, wherein the liquid diverter divides the space in a horizontal plane into separate channels.

18. The apparatus of claim 1, wherein the liquid diverter has an extraction port in a surface of the liquid diverter configured to remove a boundary layer of liquid from the surface of the liquid diverter.

19. A device manufacturing method, comprising projecting a patterned beam of radiation onto a substrate through a liquid provided in a space adjacent the substrate, wherein flow of the liquid across the space is promoted by a liquid diverter in the space.

20. The method of claim 19, wherein the liquid diverter is attached to a final element of a projection system used to project the patterned beam onto the substrate.

21. The method of claim 19, further comprising at least partly confining the liquid to the space using a liquid confinement structure, the liquid diverter attached to the liquid confinement structure.

22. The method of claim 19, wherein the liquid diverter is a vane with an elongate vertical cross-section.

23. The method of claim 19, wherein the liquid diverter has an elongate horizontal cross-section.

24. The method of claim 19, wherein the liquid diverter divides the space in a horizontal plane into separate channels.