Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method

• US 20070263197A1
• Filed: 05/09/2006
• Published: 11/15/2007
• Est. Priority Date: 05/09/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Luttikhuis, Bernardus Antonius, Cox, Henrikus, Van Der Schoot, Harmen, Van Der Pasch, Engelbertus Antonius, Loopstra, Erik
• Granted Patent: US 7,483,120 B2
• Time in Patent Office: Days
• US Class Current: 355/55
• CPC Class Codes: G03B 27/53 Automatic registration or positioning of originals with respect to each other or the photosensitive layer
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.

Claims

1. A displacement measurement system configured to measure a displacement of a component relative to a reference component, comprising:

first, second, third and fourth targets, each mounted to the reference component and arranged such that a target surface of each target is substantially parallel to a reference plane; and

first, second, third and fourth displacement sensors, each arranged to measure the displacement of a respective part of the component relative to the target surface of a respective target;

wherein said first and third displacement sensors are configured to measure the displacement of first and third parts of the component relative to the target surfaces of said first and third targets, respectively, along a direction substantially parallel to a first direction that lies within said reference plane; and

said second and fourth displacement sensors are configured to measure the displacement of second and fourth parts of the component relative to the target surfaces of said second and fourth targets, respectively, along a direction substantially parallel to a second direction that lies within said reference plane and is substantially orthogonal to said first direction.

2. A lithographic apparatus comprising:

a first displacement measurement system according to claim 1, wherein said component is a substrate table constructed to support a substrate, and wherein said first displacement measurement system is arranged to measure the displacement of the substrate table relative to the reference component at least during a process to transfer a pattern onto the substrate; and

a second displacement measuring system that is arranged to measure the displacement of the substrate table relative to the reference component at least during a process to perform one or more measurements and inspections of the substrate prior to the process to transfer the pattern onto the substrate, said second displacement measuring system comprising;

fifth, sixth, seventh and eighth targets, each mounted to the reference component and arranged such that a target surface of each target is substantially parallel to said reference plane; and

the first, second, third and fourth displacement sensors of the first displacement measurement system;

wherein said first and third displacement sensors are configured to measure the displacement of the first and third parts of the substrate table relative to the target surfaces of the fifth and seventh targets, respectively, along a direction substantially parallel to said first direction; and

wherein said second and fourth displacement sensors are configured to measure the displacement of the second and fourth parts of the substrate table relative to the target surfaces of the sixth and eighth targets, respectively, along a direction substantially parallel to said second direction.

3. A lithographic apparatus according to claim 2, wherein the first and second displacement measurement systems are arranged such that as the substrate table moves from a metrology position, in which the second displacement measurement system measures the displacement of the substrate table relative to said reference component, to a pattern transfer position, in which the first displacement measurement system measures the displacement of the substrate table relative to said reference component, at all times at least three of the first, second, third and fourth displacement sensors are able to measure the displacement of the substrate table relative to the target surface of a target.

4. A lithographic apparatus according to claim 3, wherein the first and second displacement measurement systems are arranged such that a separation of any pair of displacement sensors in a direction of movement of the substrate table, that is substantially parallel to said reference plane, is different from a separation, in said direction of movement, of a pair of boundaries between adjacent targets that are to be crossed by said displacement sensors, respectively, during a movement of the substrate table in said direction of movement.

5. A lithographic apparatus according to claim 2, further comprising one or more additional targets, each mounted to the reference component between the targets of the first and second displacement systems and such that a target surface of each of said one or more additional targets is substantially parallel to said preference plane,

wherein the lithographic apparatus is arranged such that during a movement of the substrate table between a metrology position in which the second displacement measurement system measures the displacement of the substrate table relative to said reference component, and a pattern transfer position, in which the first displacement measurement system measures the displacement of the substrate table relative to said reference component, at least one of the first, second, third and fourth displacement measurement sensors is configured to measure a displacement of the respective part of the substrate table relative to the target surface of one of said one or more additional targets.

6. A lithographic apparatus according to claim 2, further comprising:

a second substrate table constructed to support a substrate, and

fifth, sixth, seventh and eighth displacement sensors, each arranged to measure a displacement of a respective part of the second substrate table relative to the target surface of the first, second, third and fourth targets, respectively, or the fifth, sixth, seventh and eighth targets, respectively, in a manner corresponding to the measurements of the first, second, third and fourth parts of the first substrate table by the first, second, third and fourth displacement sensors, respectively.

7. A lithographic apparatus according to claim 2, further comprising a third displacement measuring system arranged to measure a displacement of the substrate table relative to the reference component during at least a part of a substrate table return movement of the substrate table from a pattern transfer position, in which the first displacement measurement system measures the displacement of the substrate table relative to said reference component, to an unload position, at which a substrate is unloaded from the substrate table.

8. A lithographic apparatus according to claim 7, wherein the third displacement measurement system comprises at least one substrate table return target, each mounted to the reference component and arranged such that a target surface of the at least one substrate table return target is substantially parallel to said reference plane;

and

wherein the first, second, third and fourth displacement measurement sensors are arranged such that during said at least part of a substrate table return movement of the substrate table, at least one of the first, second, third and fourth displacement measurement sensors is capable of measuring the displacement of the respective part of the substrate table relative to the target surface of one of said at least one substrate table return target.

9. A lithographic apparatus according to claim 8, wherein at least one of the first, second, third and fourth displacement sensors is constructed so as to measure a displacement of the respective part of the substrate table relative to the target surface of a target, along directions substantially parallel to the both the first and second directions.

10. A lithographic apparatus according to claim 7, wherein the targets of the first and second displacement measurement systems are mounted to a metrology reference frame such that the first and second displacement measurement systems measure the displacement of the substrate table relative to the metrology reference frame, and the third displacement measuring system measures the displacement of the substrate table relative to a base frame of the lithographic apparatus.

11. A lithographic apparatus according to claim 10, further comprising a position measurement system constructed to measure a position of the substrate table relative to the reference component after completion of the substrate table return movement.

12. A lithographic apparatus according to claim 11, wherein the position measurement system is arranged to measure the position of the substrate table relative to the reference component while a substrate is being loaded to the substrate table.

13. A lithographic apparatus according to claim 7, wherein said first and second displacement measuring systems are constructed so as to measure a displacement of the substrate table relative to the reference component to a greater accuracy than the third displacement measuring system.

14. A lithographic apparatus according to claim 2, further comprising a first and second reference frames, each individually mounted to said reference component;

wherein said first, second, third and fourth targets are mounted to said first reference frame, and said fifth, sixth, seventh and eighth targets are mounted to said second reference frame.

15. A lithographic apparatus according to claim 2, wherein said reference component is a metrology reference frame.

16. A displacement measurement system according to claim 1, wherein at least one of said first, second, third and fourth displacement sensors is further configured to measure a displacement of the respective part of the component relative to the respective target surface along a direction that is substantially parallel to a third direction that is substantially orthogonal to said first and second directions.

17. A lithographic apparatus according to claim 2, wherein at least one of said first, second, third and fourth displacement sensors is further configured to measure a displacement of the respective part of the substrate table relative to the surface of the fifth, sixth, seven and eighth target, respectively, along a direction substantially parallel to a third direction that is substantially orthogonal to said first and second directions.

18. A lithographic apparatus, comprising:

a substrate table constructed to support a substrate;

a first displacement measuring system configured to measure a displacement of the substrate table relative to a reference component during a process to transfer a pattern onto the substrate, the first displacement measuring system comprising at least one target mounted to the reference component and at least one displacement sensor configured to measure the displacement of at least a part of the substrate table relative to the at least one target; and

a second displacement measuring system configured to measure a displacement of the substrate table relative to a base frame of the lithographic apparatus, at least during a part of a substrate table return movement, in which the substrate table is moved from a position at which the pattern is transferred to the substrate, to an unload position, at which a substrate is unloaded from the substrate table.

19. A lithographic apparatus according to claim 18, wherein the reference component is mounted to the base frame of the lithographic apparatus with one or more vibration isolation supports.

20. A lithographic apparatus according to claim 18, further comprising a position measurement system constructed to determine a position of the substrate table relative to the reference component after completion of the substrate table return movement.

21. A lithographic apparatus according to claim 20, wherein the position measurement system is arranged to measure the position of the substrate table relative to the reference component while a substrate is being loaded to the substrate table.

23. A device manufacturing method comprising:

transferring a pattern from a patterning device onto a substrate, and

measuring a displacement of a substrate table that supports the substrate during the transferring using the method of claim 21.

22. A method of measuring a displacement of a component relative to a reference component, the method comprising:

measuring a displacement of a respective part of the component relative to a target surface of a first, second, third and fourth target using first, second, third and fourth displacement sensors, respectively, the first, second, third and fourth targets mounted to the reference component and arranged such that the target surface of each of said first, second, third and fourth targets is substantially parallel to a reference plane;

wherein said first and third displacement sensors measure a displacement of the first and third parts of the component relative to the target surface of the first and third targets, respectively, along a direction substantially parallel to a first direction that lies within said reference plane; and

wherein said second and fourth displacement sensors measure a displacement of the second and fourth parts of the component relative to the target surfaces of the second and fourth targets, respectively, along a direction substantially parallel to a second direction that lies within said reference plane and is substantially orthogonal to said first direction.

24. A device manufacturing method comprising:

transferring a pattern from a patterning device onto a substrate, the substrate being supported on a substrate table during the transferring;

measuring a displacement of the substrate table relative to a reference component during said transferring using a displacement measuring system comprising at least one target mounted to the reference component and at least one displacement sensor, the at least one displacement sensor configured to measure the displacement of at least a part the substrate table relative to the at least one target; and

measuring a displacement of the substrate table relative to a base frame of the lithographic apparatus, at least during a part of a substrate table return movement, in which the substrate table is moved from a position in which the pattern is transferred onto the substrate, to an unload position, at which the substrate is unloaded from the table.