Apparatus and Method for Particle Monitoring in Immersion Lithography

• US 20070268469A1
• Filed: 05/17/2006
• Published: 11/22/2007
• Est. Priority Date: 05/17/2006
• Status: Active Grant

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Hsu, Shu-Ping, Fu, Tzung Chi, Chang, H.Y.
• Granted Patent: US 7,602,471 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging lens; an immersion fluid retaining structure having a fluid inlet and a fluid outlet, configured to hold a fluid from the fluid inlet, at least partially filling a space between the front surface and a substrate on the substrate stage, and flowing the fluid out through the fluid outlet; and a particle monitor module integrated with the immersion fluid retaining structure.

Claims

1. An immersion lithography system, comprising:

an imaging lens having a front surface;

a substrate stage positioned under the front surface of the imaging lens;

an immersion fluid retaining structure having at least one fluid port, configured to hold a fluid from the fluid inlet for at least partially filling a space between the front surface and a substrate on the substrate stage, and receive or dispel the fluid through the fluid port; and

a particle monitor module integrated with the immersion fluid retaining structure.

2. The system of claim 1, wherein the fluid port is a fluid outlet, and the particle monitor module comprises a first liquid particle counter (LPC) coupled to the fluid outlet for monitoring particles in the fluid flowing out the fluid outlet.

3. The system of claim 1, further comprising:

a tank coupled to the fluid port for receiving the fluid;

a first liquid particle counter coupled to the tank for monitoring particles in the received fluid; and

a gas inlet coupled to the tank for supplying gas to the tank.

4. The system of claim 3, wherein the fluid port is a fluid inlet, and the particle monitor module comprises a second liquid particle counter coupled to the fluid inlet for monitoring particles in the fluid coming to the fluid inlet.

5. The system of claim 1, wherein the fluid port comprises a fluid inlet and a fluid outlet, the particle monitor module further comprises a first liquid particle counter and a second liquid particle counter, the fluid outlet is coupled to the first liquid particle counter for monitoring particles in the fluid flowing out the fluid outlet, the fluid inlet is coupled to the second liquid particle counter for monitoring particles in the fluid coming to the fluid inlet.

6. The system of claim 1, further comprising:

a data processing module configured for collecting data from the particle monitor module, analyzing the data for particle result and distributing the particle result.

7. The system of claim 6, wherein the distributing of the particle data comprises sending out warning information.

8. An immersion lithography system, comprising:

an imaging system;

a substrate stage positioned underlying the imaging system;

an immersion fluid retaining structure configured to hold a fluid at least partially filling a space between the imaging system and a substrate on the substrate stage;

a tank coupled to the immersion fluid retaining structure for receiving the fluid;

a liquid particle counter coupled to the tank for monitoring particles in the fluid; and

a gas filter coupled to the tank for providing gas to the tank for use with the liquid particle counter.

9. The system of claim 8, further comprising:

a first valve configured between the tank and the immersion fluid retaining structure;

a second valve configured between the tank and the liquid particle counter; and

a third valve configured between the gas filter and the tank.

10. The system of claim 8, further comprising:

a controller designed for controlling particle monitoring process, colleting particle data from the liquid particle counter, and processing the particle data.

11. A method for immersion photolithography patterning semiconductor integrated circuits, comprising:

flowing an immersion fluid to a space between an imaging lens and a substrate on a substrate stage, through an immersion fluid retaining module; and

monitoring particles in the immersion fluid before flowing into the space or after flowing out from the space.

12. The method of claim 11, wherein monitoring particles in the immersion fluid flowing out from the space utilizes a first liquid particle counter.

13. The method of claim 11, wherein monitoring particles in the immersion fluid before flowing into the space utilizes a second liquid particle counter.

14. The method of claim 11, wherein the monitoring further comprises:

opening a first valve coupled between the tank and an immersion fluid outlet of the immersion fluid retaining module, for filling the immersion fluid into the tank from the space;

closing the first valve after filling the tank with the immersion fluid;

opening a second valve coupled between a gas filter and the tank, for providing a gas to the tank;

maintaining the tank with the immersion fluid for a period of duration; and

opening a third valve coupled between the tank and the first liquid particle counter for flowing the immersion fluid through the first liquid particle counter, and measuring the particle in the immersion fluid.

15. The method of claim 11, further comprising illuminating the imaging lens to perform a lithographic exposing process on the substrate.

16. The method of claim 11, further comprising:

collecting data from the first liquid particle counter;

analyzing the data to provide a particle result; and

distributing the particle result.

17. The method of claim 16, wherein the distributing the particle result comprises providing warning information to a user according to the particle result.

18. The method of claim 16, wherein the collecting data comprises storing the data into a database.