Support Method and Support Structure of Optical Member, Optical Unit, Exposure Apparatus, and Device Manufacturing Method

• US 20070268470A1
• Filed: 07/14/2005
• Published: 11/22/2007
• Est. Priority Date: 07/16/2004
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Application Number:
  US11/632,452
• Publication Number:
  US 20070268470A1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G02B 7/02 for lenses supports for magnifying lenses G02B25/002
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707

Abstract

A spacer members is placed between a lens that is located at the lowermost end among a plurality of lenses and a parallel flat plate that is placed below the lens, and the lens is made to support by suspension the parallel flat plate by sucking a part of the lens and the parallel flat plate. Accordingly, the spacer member does not need to be larger than the parallel flat plate and the space in the vicinity of the parallel flat plate can be secured, compared with the case where a holding mechanism that holds the parallel flat plate by grasping it is employed. Further, since the parallel flat plate is not grasped, deformation of the parallel flat plate can be avoided, which can suppress occurrence of aberration in a projection unit.

Claims

1. A support method of an optical member, comprising:

disposing a spacer member between a first optical member and a second optical member; and

making the first optical member support the second optical member via the spacer member by sucking at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member by the spacer member.

2. The support method of an optical member according to claim 1 wherein

the spacer member vacuum-sucks at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member.

3. The support method of an optical member according to claim 1 wherein

the spacer member sucks at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member, by one of an electrostatic force and a magnetic force.

4. A support structure of an optical member, comprising:

a spacer member that is disposed between a periphery portion of a first optical member and a periphery portion of a second optical member, and makes the first optical member support the second optical member by sucking at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member.

5. The support structure of an optical member according to claim 4 wherein

the spacer member vacuum-sucks at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member.

6. The support structure of an optical member according to claim 4 wherein

the spacer member sucks at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member, by one of an electrostatic force and a magnetic force.

22. The support structure of an optical member according to claim 4 wherein

a space formed by the first optical member, the second optical member and the spacer member is filled with a liquid.

23. The support structure of an optical member according to claim 22 wherein

the spacer member has a supply flow path used to supply the liquid from the outside to the space.

24. The support structure of an optical member according to claim 22 wherein

the spacer member has a recovery flow path used to recover the liquid from the space.

7-21. -21. (canceled)

25. An optical unit that includes a plurality of optical members, the unit comprising:

a spacer member that is placed between a periphery portion of a first optical member and a periphery portion of a second optical member among the plurality of optical members, and makes the first optical member support the second optical member by sucking at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member.

26. The optical unit according to claim 25, further comprising:

a vacuum suction mechanism that is connected to the spacer member and sucks at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member by generating a negative pressure within a vent path formed at the spacer member.

27. The optical unit according to claim 25, further comprising:

a suction mechanism that sucks at least one of at least a part of a periphery portion of the first optical member and at least a part of a periphery portion of the second optical member, by one of an electrostatic force and a magnetic force.

28. The optical unit according to claim 25 wherein

a space formed by the first optical member, the second optical member and the spacer member is filled with a liquid.

29. The optical unit according to claim 28 wherein

the spacer member has a supply flow path used to supply the liquid from the outside to the space.

30. The optical unit according to claim 28 wherein

the spacer member has a recovery flow path used to recover the liquid from the space.

31. An exposure apparatus that forms an image of a predetermined pattern on an object, the apparatus comprising:

a stage on which the object is mounted; and

the optical unit according to claim 25 that forms an image of the pattern on the object.

32. The exposure apparatus according to claim 31 wherein

the second optical member is an optical member that is located closest to an image plane side among the plurality of optical members.

33. The exposure apparatus according to claim 32, further comprising:

a liquid immersion unit that forms a liquid immersion area filled with a liquid between the second optical member and the object.

34. The exposure apparatus according to claim 33 wherein

the second optical member is a parallel flat plate.

35. The exposure apparatus according to claim 33 wherein

the liquid immersion unit has a supply nozzle that supplies the liquid to a space between the second optical member and the object, and a recovery nozzle that recovers the liquid from the space between the second optical member and the object.

36. The exposure apparatus according to claim 35 wherein

a tip portion of at least one of the supply nozzle and the recovery nozzle is inserted between the second optical member and the object.

37. The exposure apparatus according to claim 35 wherein

the spacer member has an annular shape, and

a space formed by the first optical member, the second optical member and the spacer member is filled with a liquid.

38. The exposure apparatus according to claim 37 wherein

the spacer member has a flow path used to supply the liquid from the outside to the space.

39. The exposure apparatus according to claim 37 wherein

the spacer member has a supply flow path used to supply the liquid from the outside to the space and a recovery flow path used to recover the liquid from the space, and

an opening end of the supply flow path is arranged on a lower side in a gravity direction than an opening end of the recovery flow path.

40. The exposure apparatus according to claim 37, further comprising:

an annular-shaped member whose end portion on an inner circumference side is inserted between the second optical member and the object and at which the supply nozzle and the recovery nozzle are respectively formed; and

a seal member having an annular shape that is arranged between the annular member and at least one of the second optical member and the spacer member and isolates the space from the outside.

41. The exposure apparatus according to claim 40 wherein

the annular member supports at least one of the second optical member and the spacer member via the seal member when suction by the spacer member of at least one of the first optical member and the second optical member is released.

42. A device manufacturing method that includes a lithography process in which a device pattern is transferred onto an object using the exposure apparatus according to claim 31.