Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold the substrate, said substrate table comprising;
an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and a further edge seal member configured to extend across the gap between said edge seal member and said at least one of said substrate and said object and to be in contact with said at least one of said substrate and said object; and
a liquid supply system configured provide a liquid, through which said beam is to be projected, in a space between said projection system and said at least one of said substrate and said object.
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Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
167 Citations
22 Claims
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1. A lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold the substrate, said substrate table comprising;
an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and a further edge seal member configured to extend across the gap between said edge seal member and said at least one of said substrate and said object and to be in contact with said at least one of said substrate and said object; and
a liquid supply system configured provide a liquid, through which said beam is to be projected, in a space between said projection system and said at least one of said substrate and said object. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold the substrate, said substrate table comprising a support surface configured to support an intermediary plate between said projection system and at least one of said substrate and an object positioned on said substrate table and not in contact with said at least one of said substrate and said object; and
a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said at least one of said substrate and said object. - View Dependent Claims (12, 13, 14, 15, 16)
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17. A lithographic projection apparatus comprising:
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a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
a projection system configured to project the patterned beam onto a target portion of a substrate;
a substrate table configured to hold the substrate; and
a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and at least one of said substrate and an object positioned on said substrate table, wherein a structure of the liquid supply system extends along at least part of the boundary of said space between said projection system and said substrate table and capillaries extend away from said substrate table and are positioned between said structure and said projection system - View Dependent Claims (18, 19, 20, 21, 22)
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Specification