Substrate Holding Device, Exposure Apparatus, and Device Manufacturing Method

• US 20070269294A1
• Filed: 09/16/2005
• Published: 11/22/2007
• Est. Priority Date: 09/17/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Takaiwa, Hiroaki, Nagasaka, Hiroyuki, Nakano, Katsushi, Shibuta, Makoto, Yushida, Yuichi
• Granted Patent: US 8,102,512 B2
• Time in Patent Office: Days
• US Class Current: 414/217.100
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: H01L 21/6715 Apparatus for applying a liquid, a resin, an ink or the like H01L21/67126 takes precedence
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices
• CPC Class Codes: H01L 21/68735 characterised by edge profile or support profile
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions
• CPC Class Codes: Y10T 29/49002 Electrical device making

Abstract

To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PH1) formed on the base material (PHB) for holding the substrate (P), and a second holding portion (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of a processing substrate (P) held by the first holding portion (PH1). The second holding portion (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear surface (Tb) of the plate member (T). On the rear surface (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding portion (PH1) and the plate member (T) held by the second holding portion (PH2).

Claims

1. A substrate holding device for holding a substrate to be processed which is to be exposed via a liquid, comprising:

a base member,

a first holding portion that is formed on the base member and holds the substrate, and

a second holding portion that is formed on the base member and holds a plate member so as to surround the circumference of the substrate held by the first holding portion,

wherein the second holding portion holds the plate member so that a space is formed on the rear surface side of the plate member,

and wherein on the rear surface of the plate member is disposed an absorbing member that absorbs a liquid having penetrated through a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

2. A substrate holding device according to claim 1, wherein the absorbing member includes a porous member, and the substrate holding device has a recovery mechanism that suck-and-recovers a liquid held by the porous member.

23. A substrate holding device according to claim 1, wherein the plate member has a liquid-repellency relative to a liquid.

24. An exposure apparatus that is provided with a substrate holding device according to claim 1 and exposes, via liquid, a substrate held by the substrate holding device.

25. A device manufacturing method that uses an exposure apparatus according to claim 24.

3. A substrate holding device for holding a substrate to be processed which is to be exposed via a liquid, comprising:

a base member,

a first holding portion that is formed on the base member and hold the substrate, and

a second holding portion that is formed on the base member and holds a plate member so as to surround the circumference of the substrate held by the first holding portion,

wherein on a side surface of the plate member which side surface faces an object is provided a recovery port that recovers a liquid.

4. A substrate holding device according to claim 3, wherein the object is a substrate held by the first holding portion and wherein the recovery port recovers a liquid having penetrated through a gap between the substrate and the plate member held by the second holding portion.

5. A substrate holding device according to claim 3, wherein inside the plate member is formed an inner flow path which connects to the recovery port through which a liquid flows.

6. A substrate holding device according to claim 3,

wherein the second holding portion holds the plate member so that a space is formed on the rear surface side of the plate member,

wherein a suction mechanism that makes the space have a negative pressure is provided,

and wherein the inner flow path of the plate member connects the recovery port and the space.

7. A substrate holding device for holding a substrate to be processed which is to be exposed via a liquid, comprising:

a base member,

a first holding portion that is formed on the base member and holds the substrate,

and a second holding portion that is formed on the base member and holds a plate member so as to surround the circumference of the substrate held by the first holding portion,

wherein the first holding portion has a first supporting portion, having protruding shape, that supports the rear surface of the substrate and a first peripheral wall portion that is formed so as to face the rear surface of the substrate and surround the first supporting portion,

and wherein an upper surface of the first peripheral wall portion which upper surface faces the rear surface of the substrate is applied with a surface roughening treatment.

8. A substrate holding device according to claim 7,

wherein the first holding portion holds the substrate so that a space is formed on the rear surface side of the substrate

and wherein the upper surface applied with surface roughening treatment prevents, between the substrate and the upper surface,

a liquid having penetrated through a gap between the substrate held by the first holding portion and the plate member held by the second holding portion from penetrating into the space.

9. A substrate holding device according to claim 7, wherein as the surface roughening treatment, on the upper surface of the first peripheral wall portion is formed a groove portion along a circumferential direction.

10. A substrate holding device for holding a substrate to be processed which is to be exposed via liquid, comprising:

a base member,

a first holding portion that is formed on the base member and holds the substrate, and

a second holding portion that is formed on the base member and hold a plate member so as to surround the circumference of the substrate held by the first holding portion,

wherein the first holding portion has a first supporting portion, having a protruding shape, that supports the rear surface of the substrate and a first peripheral wall portion that is formed so as to face the rear surface of the substrate and surround the first supporting portion,

and wherein outside the first peripheral wall portion provided a liquid-repellent member having a liquid-repellency relative to the liquid.

11. A substrate holding device according to claim 10,

wherein the first holding portion hold the substrate so that a space is formed on the rear surface side of the substrate

and wherein the liquid-repellent member prevents a liquid having penetrated through a gap between the substrate held by the first holding portion and the plate member held by the second holding portion from penetrating into the space.

12. A substrate holding device according to claim 10, wherein the liquid-repellent member is formed to be ring-shaped so as to surround the outside of first peripheral wall portion.

13. A substrate holding device for holding a substrate to be processed which is to be exposed via liquid, comprising:

a base member,

a first holding portion that is formed on the base member and holds the substrate, and

a second holding portion that is formed on the base member and holds a plate member so as to surround the circumference of the substrate held by the first hold portion,

wherein the first holding portion has a first supporting portion, having a protruding shape, that supports the rear surface of the substrate and a first peripheral wall portion that is formed so as face the rear surface of the substrate and surround the first supporting portion,

and wherein outside the first peripheral wall portion is provided a porous member that holds a liquid having penetrated through a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

14. A substrate holding device according to claim 13, wherein the porous member is formed to be ring-shaped so as to surround the outside of peripheral wall portion.

15. A substrate holding device according to claim 13,

wherein the second holding portion has a second supporting portion, having a protruding shape, that supports the rear surface of the plate member and a second peripheral wall portion that is formed so as to face the rear surface of the plate member and surround the peripheral wall portion

and wherein the porous member is provided between the first peripheral wall portion and the second peripheral wall portion.

16. A substrate holding device according to claim 13, wherein the porous member is disposed under the gap.

17. A substrate holding device according to claim 13, comprising a recovery mechanism that is in contact with the porous member and suck-and-recovers a liquid held by the porous member.

18. A substrate holding device for holding a substrate to be processed which is to be exposed via a liquid, comprising:

a base member,

a first holding portion that is formed on the base member and holds the substrate, and

a second holding portion that is formed on the base member and holds a plate member so as to surround the circumference of the substrate held by the first holding portion,

wherein the first holding portion has a first supporting portion, having a protruding shape, that supports the rear surface of the substrate and a first peripheral wall portion that is formed so as to face the rear surface of the substrate and surround the first supporting portion,

and wherein at least a portion of the first peripheral wall portion is formed by a porous body.

19. A substrate holding device according to claim 18, provided with a recovery mechanism that suck-and-recovers a liquid on the surface of the porous body via porous body.

20. A substrate holding device according to claim 18, provided with a gas supply mechanism that blows out a gas from the surface of the porous body via the porous body.

21. A substrate holding device according to claim 18, wherein the first peripheral wall portion has an upper surface that faces the rear surface of the substrate and wherein at least the upper surface is the porous body.

22. A substrate holding device for holding a substrate to be processed which is to be exposed via a liquid, comprising:

a base member,

a first holding portion that is formed on the base member and holds the substrate, and

a second holding portion that is formed on the base member and holds a plate member so as to surround the circumference of the substrate held by the first holding portion,

wherein the first holding portion has a first supporting portion, having a protruding shape, that supports the rear surface of the substrate and a first peripheral wall portion that is formed so as to face the rear surface of the substrate and surround the first supporting portion, and

wherein a gas supply mechanism that blows out a gas from at least a portion of the first peripheral wall portion is provided.