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Ald Apparatus and Method

  • US 20070269983A1
  • Filed: 06/28/2004
  • Published: 11/22/2007
  • Est. Priority Date: 06/27/2003
  • Status: Active Grant
First Claim
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1. A chemical source vapor pressure control system (700) comprising a deposition chamber (708), a chemical source holder (722) for holding said chemical source, a chemical source heater (720), a source heater controller (728), and a deposition accumulation sensor (710), said heater controller electrically connected to said deposition accumulation sensor to control the heating of said source;

  • said system characterized by;

    said temperature controlled deposition accumulation sensor (710) located out of line-of sight with said chemical source; and

    a sensor temperature control unit (712) for controlling the temperature of said accumulation sensor to a temperature lower than the condensation temperature of the chemical source at the desired vapor pressure.

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