Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate, comprising:
- an optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern; and
an adjusting device which adjusts a surface positional relationship between a surface of the substrate and a first image plane for forming the image of the first pattern thereon and which adjusts a surface positional relationship between the surface of the substrate and a second image plane for forming the image of the second pattern thereon when a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern and the image of the second pattern via the optical system.
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Accused Products
Abstract
An exposure apparatus includes a projection optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area; and an adjusting device which adjusts a surface positional relationship between a surface of the substrate and a first image plane for forming the image of the first pattern thereon and which adjusts a surface positional relationship between the surface of the substrate and a second image plane for forming the image of the second pattern thereon when a shot area on the substrate is subjected to multiple exposure with the image of the first pattern and the image of the second pattern via the projection optical system. The substrate can be subjected to the multiple exposure satisfactorily and efficiently.
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Citations
58 Claims
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1. An exposure apparatus which exposes a substrate, comprising:
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an optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern; and
an adjusting device which adjusts a surface positional relationship between a surface of the substrate and a first image plane for forming the image of the first pattern thereon and which adjusts a surface positional relationship between the surface of the substrate and a second image plane for forming the image of the second pattern thereon when a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern and the image of the second pattern via the optical system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 42)
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33. An exposure apparatus which exposes a substrate, comprising:
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an optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern; and
a detecting system which detects position information about a first image plane for forming the image of the first pattern thereon and which detects position information about a second image plane for forming the image of the second pattern thereon;
wherein a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern and the image of the second pattern based on a detection result of the detecting system. - View Dependent Claims (34, 35, 36, 37, 38, 39, 40, 41, 57)
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43. An exposure method for performing multiple exposure for a predetermined area on a substrate with an image of a first pattern and an image of a second pattern, the exposure method comprising:
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adjusting surface positional relationship between a surface of the substrate and a first image plane on which the image of the first pattern is to be formed;
adjusting surface positional relationship between the surface of the substrate and a second image plane on which the image of the second pattern is to be formed; and
forming the image of the first pattern and the image of the second pattern in a first exposure area and a second exposure area respectively to perform the multiple exposure for the predetermined area on the substrate with the image of the first pattern and the image of the second pattern. - View Dependent Claims (44, 45, 46, 47, 48, 56)
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49. An exposure method for performing multiple exposure for a predetermined area on a substrate with an image of a first pattern and an image of a second pattern, the exposure method comprising:
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detecting position information about a first image plane on which the image of the first pattern is to be formed;
detecting position information about a second image plane on which the image of the second pattern is to be formed; and
forming the image of the first pattern and the image of the second pattern in a first exposure area and a second exposure area respectively to perform the multiple exposure for the predetermined area on the substrate with the image of the first pattern and the image of the second pattern based on the detected position informations. - View Dependent Claims (50, 51, 52, 53, 54, 55, 58)
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Specification