Exposure apparatus, exposure method, and device manufacturing method

• US 20070273858A1
• Filed: 02/16/2007
• Published: 11/29/2007
• Est. Priority Date: 02/16/2006
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Nagasaka, Hiroyuki
• Granted Patent: US 7,714,982 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70208 Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process

Abstract

An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.

Claims

1. An exposure apparatus that exposes a substrate, comprising:

an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and

a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.

2. The exposure apparatus according to claim 1, wherein a predetermined field on the substrate is multiply exposed with the first exposure light irradiated onto the first exposure field, and the second exposure light irradiated onto the second exposure field.

3. The exposure apparatus according to claim 1, wherein the detection device has a detection surface on which, at a position corresponding to a positional relationship between the first exposure field and the second exposure field, the first exposure light and the second exposure light are incident.

4. The exposure apparatus according to claim 3, wherein

the first exposure field and the second exposure field are set at different positions from each other,

and the first exposure light and the second exposure light are respectively incident on two positions of the detection surface of the detection device, the two positions corresponding to a positional relationship between the first exposure field and the second exposure field.

5. The exposure apparatus according to claim 3, wherein the detection surface of the detection device is arranged at a position being optically conjugate with a surface of the substrate or at a vicinity of the position.

6. The exposure apparatus according to claim 3, wherein at least a part of the first exposure field and at least a part of the second exposure field are overlapped.

7. The exposure apparatus according to claim 1, wherein the detection device detects at least one of the first exposure light and the second exposure light in parallel with an exposure operation for the substrate.

8. The exposure apparatus according to claim 7, wherein each of predetermined fields set on the substrate is sequentially exposed,

the exposure apparatus further comprising a storage device that stores detection results of the demon device, associated with the predetermined fields.

9. The exposure apparatus according to claim 1, further comprising a control apparatus that controls irradiation condition of at least one of the first exposure light and the second exposure light based on a detection result of the detection device.

10. The exposure apparatus according to claim 9, wherein the control apparatus adjusts quantity of light of at least one of the first exposure light and the second exposure light based on a detection result of the detection device.

11. The exposure apparatus according to claim 1, further comprising an alarm device that gives an alarm based on a detection result of the detection device.

12. The exposure apparatus according to claim 1, wherein the detection device detects quantity of light of at least one of the first exposure light and the second exposure light, which are directed towards the different direction.

26. The exposure apparatus according to claim 1, further comprising an illumination system that illuminates a first pattern with the first exposure light and illuminates a second pattern with the second exposure light, the first and second exposure light being incident on the optical element via the first and second patterns.

27. The exposure apparatus according to claim 26, further comprising a movement apparatus that synchronously executes a movement of the first and second patterns relative to first and second illumination fields irradiated with the first and second exposure lights and a movement of the substrate relative to the first and second exposure fields, a predetermined field on the substrate being multiply exposed with the first and second exposure lights by means of the synchronous movement.

28. The exposure apparatus according to claim 1, further comprising:

a first illumination system that illuminates a first pattern with the first exposure light; and

a second illumination system that illuminates a second pattern with the second exposure light, wherein

the optical system includes

a first optical system that guides the first exposure light from the first pattern to the optical element,

a second optical system that guides the second exposure light from the second pattern to the optical element, and

a third optical system that guides each of the first exposure light and the second exposure light from the optical element to the first exposure field and the second exposure field.

29. The exposure apparatus according to claim 28, further comprising:

a first mask moving device that relatively moves a first mask having the first pattern relative to the first exposure light;

a second mask moving device that relatively moves a second mask having the second pattern relative to the second exposure light; and

a substrate moving device that relatively moves the substrate relative to the first and second exposure fields, a predetermined field on the substrate being multiply exposed while synchronously executing a movement of the first mask and the second mask by means of the first mask moving device and the second mask moving device and a movement of the substrate by means of the substrate moving device.

43. The exposure apparatus according to claim 1, wherein the optical element includes a branching optical element that branches each of the first exposure light and the second exposure light.

44. The exposure apparatus according to claim 1, wherein the optical system conducts the first and second exposure lights into the optical element from different orientations.

45. The exposure apparatus according to claim 1, wherein the optical system conducts the first and second exposure lights into the optical element via different optical elements.

46. The exposure apparatus according to claim 45, wherein the optical system conducts the first and second exposure lights from the optical element to the first and second exposure fields via a same optical element.

47. The exposure apparatus according to claim 44, wherein the optical element is a transmissive type through which at least a part of the first exposure light and/or at least a part of the second exposure light are transmitted.

48. The exposure apparatus according to claim 47, wherein the optical element deflects at least a part of the first exposure light and/or at least a part of the second exposure light.

53. The exposure apparatus according to claim 1, wherein

the first exposure light via a first pattern and the second exposure light via a second pattern are incident on the optical element,

the optical system is capable of forming an image of the first pattern and an image of the second pattern on the first exposure field and the second exposure field, and is capable of forming an image of the first pattern and an image of the second pattern on the third exposure field and the fourth exposure field,

a predetermined field on the first substrate is multiply exposed with the image formed in the first exposure field of the first pattern and the image formed in the second exposure field of the second pattern,

a predetermined field on the second substrate is multiply exposed with the image formed in the third exposure field of the first pattern and the image formed in the fourth exposure field of the second pattern.

54. The exposure apparatus according to claim 53, wherein the predetermined fields on the first and second substrates are multiply exposed while moving the first pattern and the second pattern.

55. A device manufacturing method that uses the exposure apparatus according to claim 1.

13. An exposure apparatus that exposes a substrate, comprising:

an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and

a processing device that process at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields, so as to suppress an influence due to a light including at least one of the first exposure light and the second exposure light, which are directed towards the different direction.

14. The exposure apparatus according to claim 13, wherein the processing device suppresses fluctuation in optical characteristics of the optical system.

15. The exposure apparatus according to claim 13, wherein a predetermined field on the substrate is multiply exposed with the first exposure light irradiated onto the first exposure field, and the second exposure light irradiated onto the second exposure field.

16. The exposure apparatus according to claim 13, wherein at least a part of the first exposure field and at least a part of the second exposure field are overlapped.

17. The exposure apparatus according to claim 13, wherein the processing device includes a guiding optical system that optically guides a light, which is directed towards the different direction, outward from the optical system.

18. The exposure apparatus according to claim 13, wherein the processing device includes an absorption member that is capable of absorbing a light, which is directed towards the different direction.

19. The exposure apparatus according to claim 18, wherein

the processing device includes a guiding optical system that optically guides a light, which is directed towards the different direction, outward from the optical system,

and the absorption member is arranged on the outside of the optical system.

20. The exposure apparatus according to claim 19, wherein

the guiding optical system has a transmission field provided at adjacent the optical element and on a holding member that holds a plurality of optical elements of the optical system,

and the processing device includes a convergent optical system that focuses a light, which is directed towards the different direction and has passed through the transmission field, onto an absorption surface of the absorption member.

21. The exposure apparatus according to claim 20, further comprising a pin hole member provided between the convergent optical system and the absorption surface of the absorption member, and having a pin hole through which the light directed towards the different direction.

22. The exposure apparatus according to claim 20, wherein the absorption surface is arranged at an incline with respect to an optical axis of the convergent optical system.

23. The exposure apparatus according to claim 18, further comprising a heat processing device that draws a heat from the absorption member.

24. The exposure apparatus according to claim 23, wherein the heat processing device includes a cooling device that cools the absorption member.

25. The exposure apparatus according to claim 23, wherein the heat processing device includes a radiation member that is connected to the absorption member.

30. An exposure apparatus that exposes a substrate, comprising:

an optical system that has an optical element on which a first and second exposure lights are incident and from which a first and second branched lights each having the first and second exposure lights are exited, each of first and second exposure fields being irradiated with the first and second exposure lights corresponding to the first branched light, each of third and fourth exposure fields being irradiated with the first and second exposure light corresponding to the second branched light, wherein

a predetermined field on a first substrate is multiply exposed with the first and second exposure lights corresponding to the first branched light and a predetermined field on a second substrate is multiply exposed with the first and second exposure lights corresponding to the second branched light.

31. The exposure apparatus according to claim 30, wherein the optical element emits the first and second branched lights towards different directions.

32. The exposure apparatus according to claim 30, wherein at least a part of an operation of multiply exposing the first substrate and at least a part of an operation of multiplying exposing the second substrate are concurrently executed.

33. The exposure apparatus according to 30, wherein the optical element transmits a part of the first exposure light and reflects the remaining part, and reflects a part of the second exposure light and transmits the remaining part, and emits one including the transmitted first exposure light and the reflected second exposure light as the first branched light or the second branched light and another one including the reflected first exposure light and the transmitted second exposure light as the second branched light or the first branched light.

34. The exposure apparatus according to claim 30, wherein

the optical system includes:

a first optical system that guides the first exposure light to the optical element,

a second optical system that guides the second exposure light to the optical element,

a third optical system that guides each of the first and second exposure lights corresponding to the first branched light to the first and the second exposure fields, and

a fourth optical system that guides each of the first and second exposure lights corresponding to the second branched light to the third and fourth exposure fields.

35. The exposure apparatus according to claim 30, wherein at least a part of the first exposure field and at least a part of the second exposure field are overlapped, and at least a part of the third exposure field and at least a part of the fourth exposure field are overlapped.

36. The exposure apparatus according to claim 33, wherein

a predetermined field on the first substrate is multiply exposed by means of a relative movement between the first substrate and the first and second exposure fields,

a predetermined field on the second substrate is multiply exposed by means of a relative movement between the second substrate and the third and fourth exposure fields.

37. The exposure apparatus according to claim 36, further comprising a substrate moving system that moves each the first substrate and the second substrate.

38. The exposure apparatus according to claim 37, wherein the substrate moving system includes a first substrate stage that is capable of holding and moving the first substrate, and a second substrate stage that is capable of holding the second substrate, and moving independent of the first substrate stage, on a light emitting side of the optical system.

39. The exposure apparatus according to claim 37, wherein

the substrate moving system includes

a main stage that is capable of holding and moving the first substrate and the second substrate on the light emitting side of the optical system,

a first moving device that is capable of moving the first substrate relative to the main stage, and

a second moving device that is capable of moving the second substrate relative to the main stage.

40. The exposure apparatus according to claim 30, further comprising a measurement system that measures respective position information of the first substrate and the second substrate.

41. The exposure apparatus according to claim 30, further comprising an illumination system that illuminates a first pattern with the first exposure light and illuminates a second pattern with the second exposure light, wherein

the first and second exposure lights are incident on the optical element via the first and second patterns.

42. The exposure apparatus according to claim 41, further comprising a movement apparatus that synchronously executes a movement of the first and second patterns relative to first and second illumination fields irradiated with the first and second exposure lights, and a movement of the first substrate relative to the first and second exposure fields and a movement of the second substrate relative to the third and fourth exposure fields, predetermined fields on the first and second substrates being multiply exposed by means of the synchronous movement.

49. An exposure apparatus that exposes a substrate, comprising:

an optical system that includes a first system and a second system, the first system forming images of first and second patterns in a first field, the second system forming images of the first and second patterns in a second field different from the first field, a part of the second system is united in the first system, a first substrate being multiply exposed with the images formed in the first field of the first and second patterns, a second substrate being multiply exposed with the images formed in the second field of the first and second patterns.

50. The exposure apparatus according to claim 49, wherein

each of the first and second fields includes a first exposure field in which an image of the first pattern is formed and a second exposure field in which an image of the second pattern is formed, and

at least a part of the first exposure field and at least a part of the second exposure field are overlapped.

51. The exposure apparatus according to claim 49, further comprising an illumination system that illuminates the first pattern with a first exposure light and illuminates the second pattern with a second exposure light, wherein

the illumination system is capable of illuminating the first and second patterns with different conditions.

52. The exposure apparatus according to claim 51, further comprising a movement apparatus that synchronously executes a movement of the first and second patterns relative to first and second illumination fields irradiate with the first and second exposure lights, and a movement of the first and second substrates relative to the first and second fields, the first and second substrates being multiply exposed by means of the synchronous movement.

56. An exposure method for exposing a substrate, the method comprising:

irradiating first and second exposure fields with first and second exposure lights via an optical system having an optical element on which the first and second exposure lights are incident, to multiply expose the substrate; and

detecting at least one of the fit exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.

57. The exposure method according to claim 56, wherein the detection of at least one of the first exposure light and the second exposure light, which are directed towards the different direction, is executed in parallel with the multiple exposure for the substrate.

60. The exposure method according to claim 56, wherein

a first pattern is illuminated with the first exposure light,

a second pattern is illuminated with the second exposure light,

each of the first and second exposure lights is incident on the optical element via the first and second patterns.

61. The exposure method according to claim 60, wherein the multiple exposure of the substrate with the first and second exposure lights includes synchronously executing a movement of the first and second patterns relative to first and second illumination fields irradiated with the first and second exposure lights and a movement of the substrate relative to the first and second exposure fields.

66. The exposure method according to claim 56, wherein the first and second exposure lights are incident on the optical element from different orientations.

67. The exposure method according to claim 56, wherein the first and second exposure lights are incident on the optical element via different optical elements.

68. The exposure method according to claim 67, wherein the first and second exposure lights from the optical element are irradiated onto the first and second exposure fields via a same optical element.

69. The exposure method according to claim 66, wherein at least a part of the first exposure light and/or at least a part of the second exposure light are transmitted through the optical element.

70. The exposure method according to claim 69, wherein at least a part of the first exposure light and/or at least a part of the second exposure light are deflected by the optical element.

76. A device manufacturing method comprising:

exposing the substrate with the method according to claim 56;

developing the exposed substrate; and

treating the developed substrate.

58. An exposure method for exposing a substrate, the method comprising:

irradiating first and second exposure fields with first and second exposure lights via an optical system having an optical element on which the first and second exposure lights are incident, to multiply expose the substrate; and

suppressing an influence due to a light including at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.

59. The exposure method according to claim 58, wherein fluctuation in optical characteristics of the optical system due to a light directed towards the different direction is suppressed.

62. An exposure method for exposing a substrate, the method comprising:

irradiating each of first and second exposure fields with first and second exposure lights corresponding to a first branched light and each of third and fourth exposure fields with the first and second exposure lights corresponding to a second branched light by means of an optical system that has an optical element on which the first and second exposure lights are incident and from which the first and second branched lights each having the first and second exposure lights are exited; and

multiply exposing a predetermined field on a first substrate with the first branched light and a predetermined field on a second substrate with the second branched light.

63. The exposure method according to claim 62, wherein the first and second branched lights are exited from the optical element towards different directions.

64. The exposure method according to claim 62, further comprising:

illuminating a first pattern with the first exposure light and a second pattern with the second exposure light, the first and second exposure lights being incident on the optical element via the first and second patterns.

65. The exposure method according to claim 64, wherein the multiple exposure of the first and second substrates comprises synchronously executing a movement of the first and second patterns relative to first and second illumination fields irradiated with the first and second exposure lights and a movement of the first substrate relative to the first and second exposure fields and a movement of the second substrate relative to the third and fourth exposure fields.

75. The exposure method according to claim 62, wherein at least a part of the multiple exposure of the first substrate and at least a part of the multiple exposure of the second substrate are concurrently executed.

71. An exposure method for exposing a substrate, the method comprising:

forming images of first and second p on a first field and images of the first and second patterns on a second field different from the first field; and

multiply exposing a first substrate with the images formed in the first field of the first and second patterns and a second substrate with the images formed in the second field of the first and second patterns.

72. The exposure method according to claim 71, wherein each of the first and second fields includes a first exposure field in which an image of the first pattern is formed and a second exposure field in which an image of the second pattern is formed, and at least a part of the first exposure field and at least a part of the second exposure field are overlapped.

73. The exposure method according to claim 71, further comprising:

illuminating the first pattern with a first exposure light and the second pattern with a second exposure light, an illumination condition of the first exposure light to the first pattern being different from an illumination condition of the second exposure light to the second pattern.

74. The exposure method according to claim 73, wherein the multiple exposure of the first and second substrates comprises synchronously executing a movement of the first and second patterns relative to first and second illumination fields irradiated with the first and second exposure lights and a movement of the first and second substrates relative to the first and second fields.