Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate, comprising:
- an optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern; and
a first detecting system which obtains at least one of position information about the image of the first pattern to be formed in the first exposure area and position information about the image of the second pattern to be formed in the second exposure area, wherein a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern formed in the first exposure area and the image of the second pattern formed in the second exposure area.
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Accused Products
Abstract
An exposure apparatus includes a projection optical system which is capable of forming an image of a first pattern in a first exposure area and which is capable of forming an image of a second pattern in a second exposure area, the second pattern being different from the first pattern, and a first detecting system which obtains at least one of position information about the image of the first pattern and position information about the image of the second pattern. A positional relationship between the images of the first and second patterns and a predetermined area on a substrate is adjusted based on a detection result to perform multiple exposure for the predetermined area on the substrate with the images of the first and second patterns. The substrate can be subjected to the multiple exposure efficiently.
63 Citations
64 Claims
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1. An exposure apparatus which exposes a substrate, comprising:
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an optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern; and
a first detecting system which obtains at least one of position information about the image of the first pattern to be formed in the first exposure area and position information about the image of the second pattern to be formed in the second exposure area, wherein a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern formed in the first exposure area and the image of the second pattern formed in the second exposure area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 33, 34, 35, 36, 37)
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23. An exposure apparatus which exposes a substrate while moving the substrate in a scanning direction, the exposure apparatus comprising:
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an optical system which includes an optical element arranged opposite to a surface of the substrate, which irradiates a first exposure light beam from a first pattern onto a first exposure area via the optical element, and which irradiates a second exposure light beam from a second pattern onto a second exposure area via the optical element, the second exposure area being defined at a position different from that of the first exposure area in the scanning direction; and
a detecting system which detects an alignment mark on the substrate, wherein;
the optical system includes a first reflecting surface which is arranged in the vicinity of position optically conjugate with the first exposure area and the second exposure area and which guides the first exposure light beam to the optical element and a second reflecting surface which is arranged in the vicinity of position optically conjugate with the first exposure area and the second exposure area and which guides the second exposure light beam to the optical element; and
the detecting system detects the alignment mark on the substrate by irradiating a detection light beam onto the substrate via the optical element from a position between the first reflecting surface and the second reflecting surface. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63)
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38. An exposure method for performing multiple exposure for a substrate with an image of a first pattern and an image of a second pattern different from the first pattern, the exposure method comprising:
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forming the image of the first pattern in a first exposure area;
forming the image of the second pattern in a second exposure area;
obtaining at least one of position information about the image of the first pattern to be formed in the first exposure area and position information about the image of the second pattern to be formed in the second exposure area; and
performing the multiple exposure for a predetermined area on the substrate with the image of the first pattern and the image of the second pattern based on at least one of the obtained position informations. - View Dependent Claims (39, 40, 41, 42, 43, 44, 45, 46, 52)
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47. An exposure method for exposing a substrate while moving the substrate in a scanning direction, the exposure method comprising:
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irradiating a first exposure light beam from a first pattern onto a first exposure area via an optical element by reflecting the first exposure light beam by a first reflecting surface;
irradiating a second exposure light beam from a second pattern onto a second exposure area via the optical element by reflecting the second exposure light beam by a second reflecting surface, the second exposure area being defined at a different position in the scanning direction with respect to the first exposure area;
detecting an alignment mark on the substrate by irradiating a detection light beam via the optical element from a position between the first reflecting surface and the second reflecting surface; and
performing positional adjustment for the substrate and the first and second patterns based on the detected alignment mark, wherein the first reflecting surface and the second reflecting surface are arranged in the vicinity of positions optically conjugate with the first exposure area and the second exposure area. - View Dependent Claims (48, 49, 50, 51, 64)
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Specification