Maintenance Method, Exposure Method, Exposure Apparatus, And Method For Producing Device
First Claim
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1. A maintenance method for an exposure apparatus which exposes a substrate by irradiating an exposure light beam onto the substrate via a projection optical system including a plurality of optical elements, the method comprising:
- performing exposure for the substrate by irradiating the exposure light beam in a state that a predetermined space between predetermined optical elements among the plurality of optical elements is filled with a first liquid; and
substituting the first liquid in the predetermined space by a second liquid different from the first liquid when the exposure light beam is not irradiated.
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Abstract
An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical system, is filled with a liquid. When the exposure light beam is not irradiated during, for example, the maintenance or the like, the liquid in the space is substituted by a functional fluid different from the liquid. This makes it possible to reduce any influence exerted by the liquid on the exposure apparatus.
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Citations
42 Claims
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1. A maintenance method for an exposure apparatus which exposes a substrate by irradiating an exposure light beam onto the substrate via a projection optical system including a plurality of optical elements, the method comprising:
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performing exposure for the substrate by irradiating the exposure light beam in a state that a predetermined space between predetermined optical elements among the plurality of optical elements is filled with a first liquid; and
substituting the first liquid in the predetermined space by a second liquid different from the first liquid when the exposure light beam is not irradiated. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A maintenance method for an exposure apparatus which exposes a substrate by irradiating an exposure light beam onto the substrate, the method comprising:
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performing exposure for the substrate by irradiating the exposure light beam in a state that a predetermined space as a part of an optical path space of the exposure light beam is filled with a liquid; and
supplying a gas into the predetermined space, when the exposure light beam is not irradiated, while adjusting a temperature of an object forming the predetermined space to remove the liquid from the predetermined space. - View Dependent Claims (15, 16, 17, 18)
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19. An exposure method for exposing a substrate by irradiating an exposure light beam onto the substrate via a projection optical system including a plurality of optical elements, the method comprising:
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irradiating the exposure light beam onto the substrate in a state that a predetermined space between predetermined optical elements among the plurality of optical elements is filled with a first liquid; and
substituting the first liquid in the predetermined space by a second liquid different from the first liquid when the exposure light beam is not irradiated. - View Dependent Claims (20, 21, 22, 41)
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23. An exposure apparatus which exposes a substrate by irradiating an exposure light beam onto the substrate, comprising:
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a projection optical system which includes a plurality of optical elements; and
a liquid immersion mechanism which fills a predetermined space between predetermined optical elements among the plurality of optical elements with a first liquid, and which substitutes the first liquid in the predetermined space by a second liquid different from the first liquid when the exposure light beam is not irradiated. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32, 40)
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33. An exposure apparatus which exposes a substrate by irradiating an exposure light beam onto the substrate, comprising:
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a liquid immersion mechanism which fills a predetermined space as a part of an optical path space for the exposure light beam when irradiating the exposure light beam onto the substrate;
a gas supply system which supplies a gas into the predetermined space when the exposure light beam is not irradiated to remove the liquid from the predetermined space; and
a temperature-adjusting device which adjusts temperature of an object forming the predetermined space when supplying the gas. - View Dependent Claims (34, 35, 36, 37, 38, 42)
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39. An exposure apparatus which exposes a substrate by irradiating an exposure light beam onto the substrate, comprising:
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a projection optical system which includes a plurality of optical elements;
a liquid immersion mechanism which fills a predetermined space between predetermined optical elements among the plurality of optical elements with a liquid; and
a gas supply system which supplies a gas into the predetermined space when the exposure light beam is not irradiated.
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Specification