Large Area Sputtering Target

• US 20070289869A1
• Filed: 06/15/2006
• Published: 12/20/2007
• Est. Priority Date: 06/15/2006
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Ma, Xiaoguang, Ye, Zhifei, Lin, Hanzheng
• Application Number:
  US11/424,478
• Publication Number:
  US 20070289869A1
• Time in Patent Office: Days
• US Class Current: 204/298.120
• CPC Class Codes: C23C 14/3407 Cathode assembly for sputtering apparatus, e.g. Target
• CPC Class Codes: C23C 14/3414 Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Abstract

A sputtering target forming method, a sputtering target, and a method of using a sputtering target are herein disclosed. Large area sputtering targets are necessary for producing films on large area substrates. To save on material costs, the large area sputtering target can be formed of multiple target tiles that can be placed adjacent each other on a backing plate. The gaps that are present between the target tiles may to be filled to ensure that the backing plate does not sputter and contaminate the sputtering process. The material filling the gaps may be of the same composition as the sputtering target tiles. Alternatively, the entire sputtering target can be plasma sprayed onto the backing plate to ensure that the sputtering target has a unitary sputtering target body across the entire large area backing plate.

Claims

1. A sputtering target, comprising:

a backing plate; and

a plurality of sputtering target tiles, wherein a gap is present between adjacent sputtering target tiles, and wherein the gaps are filled with material that has been plasma sprayed into at least one gap.

2. The target of claim 1, wherein the material that fills the gaps has the same composition as the target tiles.

3. The target of claim 2, wherein the composition comprises molybdenum, tungsten, titanium, copper, aluminum, or alloys thereof.

4. The target of claim 1, wherein the gap comprises a slanted shape, a dovetail shape, a stepped shape, a stepped shaped with curved corners, or a convolute shape.

5. The target of claim 1, wherein the target has a length of 1 meter or more.

6. The target of claim 1, wherein the target has a length of 2 meters or more.

7. The target of claim 1, wherein the plurality of sputtering target tiles are arranged such that when the gaps between the adjacent sputtering target tiles are filled, at least one sputtering target strip is formed.

8. The target of claim 7, wherein a plurality of sputtering target strips are formed and wherein the gaps between adjacent strips are filled.

9. The target of claim 7, wherein a plurality of sputtering target strips are formed and wherein the gaps between adjacent strips are not filled.

10. The target of claim 7, wherein the gap comprises a slanted shape, a dovetail shape, a stepped shape, a stepped shaped with curved corners, or a convolute shape.

11. A sputtering target, comprising:

a backing plate; and

a plurality of sputtering target tiles, wherein a gap is present between adjacent sputtering target tiles, and wherein at least one gap is filled with wire that has been e-beam profiled into the gaps.

12. The target of claim 11, wherein the wire that fills the gaps has the same composition as the target tiles.

13. The target of claim 12, wherein the composition comprises molybdenum, tungsten, titanium, copper, aluminum, or alloys thereof.

14. The target of claim 11, wherein the gap comprises a slanted shape, a dovetail shape, a stepped shape, a stepped shaped with curved corners, or a convolute shape.

15. The target of claim 11, wherein the target has a length of 1 meter or more.

16. The target of claim 11, wherein the target has a length of 2 meters or more.

17. The target of claim 11, wherein the plurality of sputtering target tiles are arranged such that when the gaps between the adjacent sputtering target tiles are filled, at least one sputtering target strip is formed.

18. The target of claim 17, wherein a plurality of sputtering target strips are present and wherein the gaps between adjacent strips are filled.

19. The target of claim 17, wherein a plurality of sputtering target strips are present and wherein the gaps between adjacent strips are not filled.

20. A sputtering target, comprising:

a backing plate; and

a unitary sputtering target surface that has been plasma sprayed onto the backing plate.

21. The target of claim 20, wherein the target has a length of 1 meter or more.

22. The target of claim 20, wherein the target has a length of 2 meters or more.

23. A sputtering target, comprising:

a backing plate; and

a unitary sputtering target surface that comprises a plurality of wires e-beam profiled to the backing plate.

24. The target of claim 23, wherein the target has a length of 1 meter or more.

25. The target of claim 23, wherein the target has a length of 2 meters or more.