Altering pattern data based on measured optical element characteristics
First Claim
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1. A method, comprising:
- (a) generating pattern data corresponding to features to be formed on a substrate;
(b) measuring at least one of aberrations and distortions of a projection system;
(c) altering the pattern data based on measuring step (b); and
(d) transmitting the altered pattern data to a patterning device to control individually controllable elements coupled to the patterning device.
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Abstract
A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.
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Citations
33 Claims
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1. A method, comprising:
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(a) generating pattern data corresponding to features to be formed on a substrate; (b) measuring at least one of aberrations and distortions of a projection system; (c) altering the pattern data based on measuring step (b); and (d) transmitting the altered pattern data to a patterning device to control individually controllable elements coupled to the patterning device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 32)
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16. A lithographic system, comprising:
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an illumination system that processes a beam of radiation; a patterning device including a controller and an array of individually controllable elements, the controller being configured to control the array of individually controllable elements based on received pattern data to pattern the beam of radiation; a projection system that is used to project the patterned beam onto a target portion of a substrate; and a measuring system that is configured to measure at least one of aberrations or distortions of the projection system, wherein the controller uses the measured at least one of aberrations or distortions to alter the pattern data. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 33)
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Specification