Exposure apparatus, exposure method, and device manufacturing method
First Claim
1. An exposure method comprising:
- detecting, based on a reception result of a detection light from a reference surface on which the detection light is directed, a first information including a surface positional information of the reference surface;
detecting, based on a reception result of the detection light from a first surface of a first mask on which a pattern is formed, a second information including a surface positional information of the first surface, the first surface including a plurality of areas each on which the detection light is directed, the detection of the second information being executed for respective the areas, the detection of the first information being executed before the detection for the areas; and
exposing a substrate with the pattern of the first mask.
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Accused Products
Abstract
A substrate is exposed by a first operation wherein detection light is directed upon a specified reference surface to detect surface positional information of a reference surface based on results of reception of detection light through the reference surface and by a second operation wherein detection light is directed upon a specified area of a first surface of a first mask to detect surface positional information of area based on results of reception of detection light through a first surface. The second operation is implemented a plurality of times for each of the plurality of areas of the first surface, and the first operation is implemented for each second operation before the second operation.
20 Citations
29 Claims
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1. An exposure method comprising:
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detecting, based on a reception result of a detection light from a reference surface on which the detection light is directed, a first information including a surface positional information of the reference surface;
detecting, based on a reception result of the detection light from a first surface of a first mask on which a pattern is formed, a second information including a surface positional information of the first surface, the first surface including a plurality of areas each on which the detection light is directed, the detection of the second information being executed for respective the areas, the detection of the first information being executed before the detection for the areas; and
exposing a substrate with the pattern of the first mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 13, 14, 15, 16, 17, 18, 19)
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12. An exposure method comprising:
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detecting a first information including surface positional information of a reference surface of a reference mask whereupon a pattern is formed;
obtaining a reference correction value for exposing a substrate in desired state via the reference mask;
detecting a second information including surface positional information of a first surface of a first mask;
obtaining a first correction value for exposing the substrate in desired state via the first mask based on the first information, the second information, and the reference correction value; and
exposing the substrate with pattern formed on the first surface of the first mask based on exposure condition adjusted based on the first correction value.
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20. An exposure apparatus that exposes a substrate with a pattern formed on a first surface of a first mask, the exposure apparatus comprising:
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a holding member that holds the first mask;
a first detection apparatus that directs a detection light onto a specified area of the first surface of the first mask held by the holding member via a first opening formed on the holding member and can detect surface positional information of the area based on a reception result of the detection light from the first surface, and directs the detection light onto a specified reference surface and can detect surface positional information of the reference surface based on a reception result of the detection light from the reference surface; and
a control apparatus that controls the first detection apparatus to detect surface positional information of each of a plurality of areas of the first surface, and controls the detecting operation for the reference surface with the first detection apparatus such that the detecting operation is implemented in each detecting operation for the areas before the detecting operation for the areas. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 29)
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28. An exposure apparatus that exposes a substrate with a pattern formed on a first surface of a first mask, the exposure apparatus comprising:
a first detection apparatus that detects surface positional information of the first surface of the first mask;
a first storage apparatus that pre-stores surface positional information of a second surface whereupon a pattern of a second mask different from the first mask is formed;
a second storage apparatus that pre-stores a second correction value for exposing the substrate in desired state using the second mask; and
a control apparatus that determines a first correction value for exposing the substrate in desired state using the first mask based on the detection result of the first detection apparatus, the stored information in the first storage apparatus, and the stored information in the second storage apparatus.
Specification