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Exposure apparatus, exposure method, and device manufacturing method

  • US 20070291261A1
  • Filed: 04/13/2007
  • Published: 12/20/2007
  • Est. Priority Date: 04/14/2006
  • Status: Abandoned Application
First Claim
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1. An exposure method comprising:

  • detecting, based on a reception result of a detection light from a reference surface on which the detection light is directed, a first information including a surface positional information of the reference surface;

    detecting, based on a reception result of the detection light from a first surface of a first mask on which a pattern is formed, a second information including a surface positional information of the first surface, the first surface including a plurality of areas each on which the detection light is directed, the detection of the second information being executed for respective the areas, the detection of the first information being executed before the detection for the areas; and

    exposing a substrate with the pattern of the first mask.

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