Exposure Apparatus, Exposure Method, and Producing Method of Microdevice
First Claim
1. An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units onto an object, comprising a correcting device which corrects a position of at least one of a plurality of images projected onto the object by the plurality of optical units so that displacements of the optical units are compensated.
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Accused Products
Abstract
An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting device which corrects a position of at least one of a plurality of images to be projected onto the object P by the plurality of optical units L1 to L13 so that displacements of the optical units L1 to L13 are compensated.
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Citations
37 Claims
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1. An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units onto an object, comprising
a correcting device which corrects a position of at least one of a plurality of images projected onto the object by the plurality of optical units so that displacements of the optical units are compensated.
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26. A scanning type exposure apparatus comprising
a first exposure unit including a first variable forming mask which modulates a light beam emitted from a light source in accordance with image data, and a second exposure unit including a second variable forming mask which modulates a light beam emitted from a light source in accordance with image data, the second exposure unit being different from the first exposure unit, wherein a stage on which an object is mounted is relatively scanned with respect to the first variable forming mask and the second variable forming mask, so that images produced by the first exposure unit and the second exposure unit is exposure-transferred onto the object, the stage is provided thereon with a beam intensity measuring system which measures beam intensity of the first exposure unit and the second exposure unit in a region where overlap exposure is carried out by the first exposure unit and the second exposure unit, and the beam intensity of at least one of the first exposure unit and the second exposure unit is adjusted based on a measurement result of the beam intensity measuring system.
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37. An exposure method for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units onto an object, comprising
correcting a position of at least one of a plurality of images projected onto the object by the plurality of optical units so that displacement of the optical units are compensated while exposure is carried out.
Specification