LASER PLASMA SPECTROSCOPY APPARATUS AND METHOD FOR IN SITU DEPTH PROFILING

• US 20070296966A1
• Filed: 06/27/2006
• Published: 12/27/2007
• Est. Priority Date: 06/27/2006
• Status: Active Grant

• Current Assignee: GE Infrastructure Technology, LLC (GE Vernova, Inc.)
• Original Assignee: General Electric Company
• Inventors: SCHUMAKER, TYMM BRADNER, BENICEWICZ, PAMELA KING, ROZIER, ELENA, VIERTL, JOHN RUEDIGER MADER, FOMITCHOV, PAVEL ALEXEYEVICH
• Granted Patent: US 7,440,097 B2
• Time in Patent Office: Days
• US Class Current: 356/318
• CPC Class Codes: G01J 3/2889 Rapid scan spectrometers; Time resolved spectrometry
• CPC Class Codes: G01J 3/443 Emission spectrometry
• CPC Class Codes: G01N 2021/1782 In-depth resolution
• CPC Class Codes: G01N 21/718 Laser microanalysis, i.e. with formation of sample plasma

Abstract

An in-situ laser plasma spectroscopy (LPS) system for automated near real-time elemental depth profiling of a target including: an optical source configured to generate an optical beam, wherein the optical beam is pulsed; an optical probe system configured to deliver the optical beam from the optical source to a surface of a target to generate an ablation plasma; a time resolved spectral detection system configured to generate time resolved spectral data from emission signals from the ablation plasma; and a data acquisition and processing system configured to acquire the time resolved spectral data to determine, in combination with predetermined calibration data, an absolute elemental concentration as a function of depth in near real-time.

Claims

1. An in-situ laser plasma spectroscopy (LPS) system for automated near real-time elemental depth profiling of a target, comprising:

an optical source configured to generate an optical beam, wherein the optical beam is pulsed;

an optical probe system configured to deliver the optical beam from the optical source to a surface of a target to generate an ablation plasma;

a time resolved spectral detection system configured to generate time resolved spectral data from emission signals from the ablation plasma; and

a data acquisition and processing system configured to acquire the time resolved spectral data to determine, in combination with predetermined calibration data, an absolute elemental concentration of the target as a function of depth in near real-time.

2. The system of claim 1, wherein the optical probe system is configured to deliver the optical beam the surface of a target comprising a coating on a substrate.

3. The system of claim 1, wherein the optical probe system comprises a beam-shaping element configured to control one or more beam parameters.

4. The system of claim 3, wherein the beam-shaping element comprises an intensity-homogenizing element to produce an optical illumination zone of substantially uniform optical energy on the surface of the target.

5. The system of claim 4, wherein the intensity-homogenizing element is at least one device selected from the group consisting of spatial filters, mode scramblers, non-linear attenuators, and combinations thereof.

6. The system of claim 3, wherein the beam-shaping element is a beam collimating element.

7. The system of claim 6, wherein the collimating element comprises a positive lens and negative lens combination.

8. The system of claim 1, wherein the optical probe system comprises a spectral separation element to spatially separate emission signals from the path of the optical beam.

9. The system of claim 1, wherein the optical probe system comprises an optical pulse delivery fiber configured to deliver the optical beam to the surface of the target.

10. The system of claim 9, wherein the optical pulse delivery fiber is further configured to collect the emission signals from the plasma.

11. The system of claim 9, wherein the optical probe system further comprises a probe head coupled to the optical pulse delivery fiber, the probe head comprising a probe lens configured to focus and direct the optical beam at surface of the target.

12. The system of claim 11, wherein the optical probe system further comprises an alignment fixture for aligning the probe head to direct the optical beam substantially normal to the surface of the target.

13. The system of claim 12, wherein the alignment fixture comprises a sheath encasing at least part of the optical pulse delivery fiber and the probe lens, wherein the sheath extends beyond the probe lens by a length substantially equal to a focal length of the probe lens.

14. The system of claim 11, wherein the optical probe system further comprises a probe head position controller to dynamically adjust the probe head distance from the surface of the target.

15. The system of claim 1, wherein the optical probe system comprises a configuration for sub-volume sampling of the ablation plasma.

16. The system of claim 1, wherein the optical probe system comprises off-axially positioned emission signal delivery fiber.

17. The system of claim 1, wherein the optical source comprises a pulsed laser source.

18. The system of claim 16, wherein the optical source comprises a Nd:

YAG laser, wherein the optical beam comprises a fundamental or a harmonic of Nd;

YAG laser output.

19. The system of claim 1, wherein the time resolved spectral detection system comprises a spectrometer and a photodetector.

20. The system of claim 19, wherein the photodetector is at least one device selected from the group consisting of a photo-diode array, a charge coupled device, an intensified charge-coupled device, a gated charge coupled device, an array of individually positioned photomultipliers, and combinations thereof.

21. The system of claim 19, further comprising a photodetector controller configured to time-gate and delay photodetector activation to generate the time resolved spectral data.

22. The system of claim 1, wherein the data acquisition and processing system is configured to receive calibration data from a computer readable medium.

23. The system of claim 1, wherein the data acquisition and processing system comprises a portable computing device for performing near real-time analysis.

24. The system of claim 1, wherein two or more elements of the system are removably coupled together.

25. The system of claim 1, wherein the target is a component of a turbine system.

26. An in-situ, portable laser plasma spectroscopy system for automated near real-time elemental depth profiling of a coating, comprising:

an optical source configured to generate an optical beam, wherein the optical beam is pulsed;

an optical probe system configured to deliver the optical beam from the optical source to a surface of a coating on a substrate to generate an ablation plasma, wherein the optical probe system comprises a beam-shaping element to produce an optical illumination zone of substantially uniform optical energy through a thickness of the coating;

a time resolved spectral detection system configured to generate time resolved spectral data from emission signals from the ablation plasma; and

a data acquisition and processing system configured to acquire the time resolved spectral data to determine, in combination with predetermined calibration data, an absolute elemental concentration of the coating as a function of depth in near real-time.

27. The system of claim 26, wherein the data acquisition and processing system is configured to stop ablation of the target on determination of a predetermined level of increase or decrease in elemental concentration of an element present or absent in the coating or substrate.

28. A method for in-situ, near real time depth profiling, comprising:

(a) acquiring calibration data;

(b) performing at least one ablation cycle comprising;

generating an optical beam, wherein the optical beam is pulsed;

homogenizing the intensity of the optical beam to produce an optical illumination zone of substantially uniform optical energy on a surface of the target; and

delivering the optical beam at the surface of the coating to generate an ablation plasma;

(c) generating time resolved spectral data from emission signals received from the ablation plasma; and

(d) using the time resolved spectral data and the calibration data for determining absolute elemental concentration at the probed surface of the target in near real-time.

29. The method of claim 28, comprising collimating the optical beam to produce uniform ablation in successive ablation cycles.

30. The method of claim 28, wherein the calibration data comprises elemental spectral intensity calibration data and depth calibration data.

31. The method of claim 30, wherein acquiring elemental spectral intensity calibration data comprises determining elemental spectral intensity for a given concentration using a calibration target with a known elemental concentration using electron microprobe analysis.

32. The method of claim 30, wherein acquiring depth calibration data comprises determining ablation depth per incident pulse of the optical beam using a calibration target with known ablation depth and corresponding number of ablation cycles.

33. The method of claim 28, comprising performing a plurality of ablation cycles and combining spectral data from two or more successive ablation cycles to generate elemental concentration at a desired resolution.

34. The method of claim 28, comprising repeating steps (a) to (d) to determine elemental concentration in successively ablated surfaces of the target.

35. The method of claim 28, further comprising dynamically adjusting a distance between a probe-head delivering the optical beam to the surface of the target and the surface of the target for successive ablation cycles.

36. The method of claim 28, wherein the target comprises a coating on a substrate.

37. The method of claim 36, further comprising monitoring the elemental concentration of an element present or absent in the coating or substrate.

38. The method of claim 37, further comprising stopping ablation of the target and concluding data acquisition on determination of a predetermined level of increase or decrease in the elemental concentration of an element present or absent in the coating or substrate, to prevent damage to the substrate.