ELECTROCONDUCTIVE LAMINATE, AND ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY AND PROTECTIVE PLATE FOR PLASMA DISPLAY

• US 20070298265A1
• Filed: 08/16/2007
• Published: 12/27/2007
• Est. Priority Date: 02/17/2005
• Status: Active Grant

• Current Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Original Assignee: Asahi Glass Ceramics Company Limited (AGC, Inc.), Asahi Glass Company, Limited (AGC, Inc.)
• Inventors: Morimoto, Tamotsu, Kawasaki, Masato, Kanda, Koichi, Nakagama, Susumu, Hiramoto, Makoto
• Granted Patent: US 7,740,946 B2
• Time in Patent Office: Days
• US Class Current: 428/432
• CPC Class Codes: B32B 17/10018 comprising only one glass sheet
• CPC Class Codes: H05K 9/0096 for television displays, e.g. plasma display panel

Abstract

To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance.

An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.

Claims

1. An electroconductive laminate comprising a substrate, and an electroconductive film having a three-layer structure having a first oxide layer, a metal layer and a second oxide layer laminated sequentially from the substrate side, or having a 3×

n layer structure (wherein n is an integer of at least

     2) having the above three-layer structure repeated, wherein the first oxide layer is a layer containing, as calculated as oxides, “

ZnO” and

“

TiO₂ or Nb₂O₅”

in a total amount of at least 90 mass % based on the total mass of the first oxide layer;

the metal layer is a layer containing silver; and

the second oxide layer is one member selected from the group consisting of, as calculated as oxides, a layer containing ZnO and Al₂O₃ in a total amount of at least 90 mass % based on the total mass of the second oxide layer, a layer containing ZnO and Ga₂O₃ in a total amount of at least 90 mass % based on the total mass of the second oxide layer, a layer containing In₂O₃ and SnO₂ in a total amount of at least 90 mass % based on the total mass of the second oxide layer, a layer containing In₂O₃ and CeO₂ in a total amount of at least 90 mass % based on the total mass of the second oxide layer, and a layer containing SnO₂ in an amount of at least 90 mass % based on the total mass of the second oxide layer.

2. The electroconductive laminate according to claim 1, wherein the electroconductive film has a 3×

n layer structure (wherein n is an integer of from 2 to

     8).

3. The electroconductive laminate according to claim 1, wherein the metal layer is a layer made of pure silver or a silver alloy containing at least one member selected from gold and bismuth.

4. The electroconductive laminate according to claim 3, wherein the metal layer is a layer made of a silver alloy containing at least one metal selected from gold and bismuth in an amount of from 0.2 to 1.5 mass % in the metal layer.

5. The electroconductive laminate according to claim 1, wherein the second oxide layer is a layer containing, as calculated as oxides, ZnO and Al₂O₃ in a total amount of at least 90 mass % based on the total mass of the second oxide layer, and the amount of aluminum is from 1 to 10 at % based on the total amount of aluminum and zinc.

6. The electroconductive laminate according to claim 1, which further has a protective film on the surface of the electroconductive film.

7. The electroconductive laminate according to claim 6, wherein the protective film is a layer containing In₂O₃ and SnO₂ in a total amount of at least 90 mass % based on the total mass of the protective film.

8. An electromagnetic wave shielding film for a plasma display, which is the electroconductive laminate as defined in claim 1.

9. A protective plate for a plasma display, comprising a support, the electromagnetic wave shielding film for a plasma display as defined in claim 8 formed on the support, and an electrode electrically in contact with the electroconductive film of the electromagnetic wave shielding film for a plasma display.

10. The protective plate for a plasma display according to claim 9, which further comprises an electroconductive mesh film.