METHOD AND SYSTEM FOR SEALING A SUBSTRATE
First Claim
1. A method of sealing a microelectromechanical system (“
- MEMS”
) device from ambient conditions, comprising;
providing a substrate comprising a MEMS device;
forming a metal seal on the substrate; and
attaching a backplane to the metal seal so as to seal the MEMS device from ambient conditions.
3 Assignments
0 Petitions
Accused Products
Abstract
A method of sealing a microelectromechanical system (MEMS) device from ambient conditions is described, wherein the MEMS device is formed on a substrate and a substantially hermetic seal is formed as part of the MEMS device manufacturing process. The method comprises forming a metal seal on the substrate proximate a perimeter of the MEMS device using a method such as photolithography. The metal seal is formed on the substrate while the MEMS device retains a sacrificial layer between conductive members of MEMS elements, and the sacrificial layer is removed after formation of the seal and prior to attachment of a backplane.
94 Citations
26 Claims
-
1. A method of sealing a microelectromechanical system (“
- MEMS”
) device from ambient conditions, comprising;
providing a substrate comprising a MEMS device;
forming a metal seal on the substrate; and
attaching a backplane to the metal seal so as to seal the MEMS device from ambient conditions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
- MEMS”
-
11. A method of making a microelectromechanical system (“
- MEMS”
) device, comprising;
providing a MEMS device formed on a substrate;
depositing an insulator over the MEMS device;
forming a sealant wall proximate a perimeter of the MEMS device; and
attaching a backplane to the sealant wall. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
- MEMS”
Specification