Method of forming a transistor having gate protection and transistor formed according to the method
First Claim
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1. A microelectronic device comprising:
- a transistor gate;
a first spacer and a second spacer respectively adjacent a first side and a second side of the gate;
a diffusion layer supra-adjacent the gate;
contact regions super-adjacent the diffusion layer and adjacent the first spacer and the second spacer;
a protective cap super-adjacent the gate and between the contact regions, the protective cap being adapted to protect the device from shorts between the gate and the contact regions.
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Abstract
A microelectronic device and a method of forming same. The method comprises: a transistor gate; a first spacer and a second spacer respectively adjacent a first side and a second side of the gate; a diffusion layer supra-adjacent the gate; contact regions super-adjacent the diffusion layer and adjacent the first spacer and the second spacer; a protective cap super-adjacent the gate and between the contact regions, the protective cap being adapted to protect the device from shorts between the gate and the contact regions.
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Citations
30 Claims
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1. A microelectronic device comprising:
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a transistor gate; a first spacer and a second spacer respectively adjacent a first side and a second side of the gate; a diffusion layer supra-adjacent the gate; contact regions super-adjacent the diffusion layer and adjacent the first spacer and the second spacer; a protective cap super-adjacent the gate and between the contact regions, the protective cap being adapted to protect the device from shorts between the gate and the contact regions. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of making a microelectronic device comprising:
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providing a transistor structure including a transistor gate, a diffusion layer supra-adjacent the gate, a first spacer adjacent one side of the gate and a second spacer adjacent another side of the gate; providing a protective cap super-adjacent the gate; providing contact regions super-adjacent the diffusion layer, the contact regions including a first contact region adjacent the first spacer and one side of the protective cap, and a second contact region adjacent the second spacer and an opposite side of the protective cap. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A system comprising:
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a microelectronic device comprising; a transistor gate; a first spacer and a second spacer respectively adjacent a first side and a second side of the gate; a diffusion layer supra-adjacent the gate; contact regions super-adjacent the diffusion layer and including a first contact region adjacent the first spacer and a second contact region adjacent the second spacer; a protective cap super-adjacent the gate and adjacent the first contact region and the second contact region, the protective cap being adapted to protect the device from shorts between the gate and the contact regions; and a graphics processor coupled to the module. - View Dependent Claims (29, 30)
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Specification