Control system for pattern generator in maskless lithography
First Claim
1. A lithographic apparatus, comprising:
- an illumination system configured to condition a radiation beam;
an array of individually controllable elements capable of patterning the radiation beam;
a projection system configured to project the patterned beam onto a target portion of the substrate; and
a control system arranged to send control signals, which control the array of individually controllable elements, such that a desired pattern is projected onto the substrate, the control system configured to calculate the control signals using a bandwidth limited base function or a combination of more than one bandwidth limited base function.
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Accused Products
Abstract
A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, and a control system. The illumination system is configured to condition a radiation beam. The array of individually controllable elements is capable of modulating the cross-section of the radiation beam. The projection system is configured to project the modulated radiation beam onto a target portion of a substrate. The control system is arranged to send control signals, which control the array of individually controllable elements, such that a desired pattern is projected onto the substrate. The control system calculates the control signals using a bandwidth limited base function or a combination of more than one bandwidth limited base functions.
25 Citations
9 Claims
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1. A lithographic apparatus, comprising:
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an illumination system configured to condition a radiation beam; an array of individually controllable elements capable of patterning the radiation beam; a projection system configured to project the patterned beam onto a target portion of the substrate; and a control system arranged to send control signals, which control the array of individually controllable elements, such that a desired pattern is projected onto the substrate, the control system configured to calculate the control signals using a bandwidth limited base function or a combination of more than one bandwidth limited base function. - View Dependent Claims (2, 3)
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4. A method of lithography, comprising:
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calculating control signals using a bandwidth limited base function or a combination of more than one bandwidth limited base function; controlling an array of individually controllable elements using the control signals; patterning a radiation beam using the controlled array of individually controllable elements; and projecting the patterned radiation beam onto a target portion of a substrate. - View Dependent Claims (5, 6)
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7. A computer program product comprising a computer useable medium having computer program logic stored thereon for controlling at least one processor, the computer program logic comprising:
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first computer program code means for calculating control signals using a bandwidth limited base function or a combination of more than one bandwidth limited base function; second computer program code means for controlling an array of individually controllable elements using the control signals; wherein a radiation beam is patterned using the controlled array of individually controllable elements; and wherein the patterned beam is projected onto a target portion of a substrate. - View Dependent Claims (8, 9)
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Specification