Method of optimizing imaging performance

• US 20080007706A1
• Filed: 06/08/2007
• Published: 01/10/2008
• Est. Priority Date: 04/09/2004
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Maul, Manfred, Wegmann, Ulrich, Reisinger, Gerd, Graeupner, Paul, Schriever, Martin
• Granted Patent: US 7,570,345 B2
• Time in Patent Office: Days
• US Class Current: 355/067
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70216 Mask projection systems

Abstract

A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.

Claims

1. A projection exposure system comprising an illumination optical system having a pupil plane and including a light source for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure into a corresponding field in a substrate-plane for exposing substrates with images of the patterning structure in a manufacturing process of miniaturized articles formed from the exposed substrates,

wherein the illumination optical system comprises:

a first optical integrator system for illuminating a first region of a first size of the patterning structure; and

at least a second optical integrator system for illuminating a second region of the patterning structure which has a second size which is different from the first size, wherein the first and at least second optical integrator are arranged such that the first optical integrator can be exchanged for the at least second optical integrator system;

wherein a distribution of illumination intensity in a pupil plane of the illumination optical system in terms of shape and size is substantially the same for the first and at least second optical integrator system.

2. The projection exposure system of claim 1, wherein the first and at least second optical integrator system each comprise a diffractive or refractive optical raster element.

3. The projection exposure system of claim 2, wherein the first and at least second optical integrator system further each comprise a glass rod.

4. The projection exposure system of claim 1, wherein the first and at least second optical integrator system each comprise a fly'"'"'s eye condenser.