MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
First Claim
1. A plasma processing chamber having at least two processing regions to enable individual or simultaneous processing of at least two wafers, comprising:
- a chamber body defining at least two plasma processing regions, each processing region having a cathode situated at a lower part thereof and an anode situated in a ceiling thereof, said chamber body defining an evacuation path;
at least one vacuum pump coupled to the evacuation path;
at least two RF match circuits, each RF match circuit simultaneously coupling at least a first RF frequency and a second RF frequency to one of the cathodes; and
, wherein the first frequency is higher than the second frequency.
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Accused Products
Abstract
A tandem processing-zones chamber having plasma isolation and frequency isolation is provided. At least two RF frequencies are fed from the cathode for each processing zones, where one frequency is about ten times higher than the other, so as to provide decoupled reactive ion etch capability. The chamber body is ground all around and in-between the two processing zones. The use of frequency isolation enables feed of multiple RF frequencies from the cathode, without having crosstalk and beat. A plasma confinement ring is also used to prevent plasma crosstalk. A grounded common evacuation path is connected to a single vacuum pump.
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Citations
32 Claims
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1. A plasma processing chamber having at least two processing regions to enable individual or simultaneous processing of at least two wafers, comprising:
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a chamber body defining at least two plasma processing regions, each processing region having a cathode situated at a lower part thereof and an anode situated in a ceiling thereof, said chamber body defining an evacuation path;
at least one vacuum pump coupled to the evacuation path;
at least two RF match circuits, each RF match circuit simultaneously coupling at least a first RF frequency and a second RF frequency to one of the cathodes; and
,wherein the first frequency is higher than the second frequency. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A tandem plasma etch chamber, comprising:
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a conductive chamber body defining a first process region and a second process region;
the chamber body having a partition wall separating the first process region and the second process region;
said chamber body further comprising an evacuation chamber in fluid communication with the first process region and the second process region;
said evacuation chamber having a single evacuation port;
the chamber body coupled to a ground potential;
a vacuum pump coupled to the evacuation port;
a first fixed cathode affixed at bottom part of the first process region and comprising a first chuck for supporting a wafer;
a first showerhead affixed at a ceiling of the first process region;
the first showerhead comprising a first electrode;
a second fixed cathode affixed at bottom part of the second process region and comprising a second chuck for supporting a wafer;
a second showerhead affixed at a ceiling of the second process region;
the second showerhead comprising a second electrode;
a common gas source providing process gas to the first showerhead and the second showerhead;
a first RF match concurrently coupling at least one low RF frequency and one high RF frequency to the first cathode;
a second RF match concurrently coupling at least one low RF frequency and one high RF frequency to the second cathode;
wherein the high RF frequency is at least two times higher than the low RF frequency. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A decoupled reactive ion etch chamber, comprising:
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a conductive chamber body defining a plurality of process regions;
the chamber body having partition walls separating the plurality of process regions from each other;
said partition walls comprising a fluid conductance channel to equate pressure among the process regions;
said chamber body further comprising an evacuation chamber in fluid communication with the process regions;
the chamber body coupled to a ground potential;
at least one vacuum pump coupled to the evacuation chamber;
a plurality of cathodes, each cathode affixed at bottom part of a corresponding one of the process regions and comprising a chuck for supporting a wafer;
a plurality of showerheads, each affixed at a ceiling of a corresponding one of the process regions and comprising an electrode;
a common gas source providing process gas to the showerheads;
a plurality of RF matches, each concurrently coupling at least one low RF frequency and one high RF frequency to a corresponding one of the cathodes. - View Dependent Claims (27, 28, 29, 30, 31, 32)
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Specification